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Monocrystalline silicon pulling furnace, and pulling method for growing monocrystalline silicon

A technology for growing single crystal silicon and single crystal silicon, applied in the direction of single crystal growth, single crystal growth, crystal growth, etc., can solve the problems of complex and uneconomical production process of solid silicon material, and achieve energy saving, investment saving, The effect of reducing energy consumption

Inactive Publication Date: 2018-07-20
新疆知信科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Chemical vapor deposition or thermal decomposition of gaseous silicon sources is generally carried out at high temperatures, while the production of crystalline silicon from solid silicon materials is generally heated from room temperature to above the melting temperature of silicon. Therefore, from an energy perspective, from high-temperature gaseous silicon sources to It is uneconomical to produce crystalline silicon from solid silicon material at room temperature and then to molten high-temperature silicon liquid
In addition, the production process of solid silicon material itself is relatively complicated and requires special equipment, such as the free space method disclosed in patents CN200580017512 and EP2019084A2. Solid silicon grown from polycrystalline ingots or single crystals

Method used

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  • Monocrystalline silicon pulling furnace, and pulling method for growing monocrystalline silicon

Examples

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Embodiment 1

[0031] Such as figure 1 As shown, this embodiment provides a single crystal silicon pulling furnace, comprising: a furnace cavity 1, a tubular reactor 2 for heating, a crucible 3, a single crystal silicon pulling mechanism 4, and a The heater for heating the crucible 3, the gaseous silicon source thermally decomposes and reacts in the tubular reactor 2 to generate silicon powder, the silicon powder or silicon powder melts into molten silicon and enters the crucible 3, and the single crystal silicon pulling mechanism 4 is installed in the crucible Above 3, the single crystal silicon pulling mechanism 4 is used to pull the seed crystal to pull the molten silicon in the crucible 3 to grow single crystal silicon.

[0032] Specifically, the tube reactor 2 in this embodiment includes a tube body 21 and a heating element 22 for heating the tube body 21. The tube body 21 includes a tube body inlet 211 and a tube body outlet 212. The gas silicon source is provided by a tube body. The ...

Embodiment 2

[0056] Such as figure 2 As shown, the difference between the pulling device for growing single crystal silicon in this embodiment and that in Embodiment 1 is that the crucible 3 in this embodiment includes a first sub-crucible 31 and a second sub-crucible 32, and the first sub-crucible 31 Set in the second sub-crucible 32, the openings of the first sub-crucible 31 and the second sub-crucible 32 are set in the same direction, the bottom of the first sub-crucible 31 and the second sub-crucible 32 are connected, and silicon powder or silicon powder is melted into molten silicon and enters In one of the sub-crucibles 3 , the single crystal silicon pulling mechanism 4 is used to pull the seed crystal to pull the molten silicon in the other sub-crucible 3 to grow single crystal silicon. Since the bottoms of the first sub-crucible 31 and the second sub-crucible 32 are connected, the molten silicon in the first sub-crucible 31 and the second sub-crucible 32 can communicate with each ...

Embodiment 3

[0071] This embodiment also provides a pulling method for growing single crystal silicon using the pulling device for growing single crystal silicon in embodiment 1. The difference between the method in this embodiment and the method in embodiment 1 is that:

[0072] The gaseous silicon source in this embodiment is trichlorosilane.

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Abstract

The invention discloses a monocrystalline silicon pulling furnace, and a pulling method for growing monocrystalline silicon. The monocrystalline silicon pulling furnace comprises a furnace chamber, atubular reactor for heating, a crucible, a monocrystalline silicon pulling mechanism and a heater for heating the crucible are arranged in the furnace chamber, a gaseous silicon source undergoes a thermal decomposition reaction in the tubular reactor to generate silicon powder, the silicon powder or molten silicon formed after melting the silicon powder enters the crucible, the monocrystalline silicon pulling mechanism is arranged above the crucible, and the monocrystalline silicon pulling mechanism is used for pulling seed crystals to achieve pulling growth of the molten silicon in the crucible into monocrystalline silicon. The furnace and the method omit the production step of a solid silicon material, so the energy consumption is reduced, the huge investment for the production and processing of the solid silicon material is saved, and the pollution introduction problem of the solid silicon material is avoided, thereby the purity of the generated monocrystalline silicon is ensured; and compared with continuous feeding of the solid silicon material, the supplementation of the molten silicon material through the thermal decomposition of the gaseous silicon source has the advantagesof simplicity in realization, and accuracy in control of the supplementing speed of the molten silicon material.

Description

technical field [0001] The invention belongs to the technical field of crystal silicon growth, and in particular relates to a single crystal silicon pulling furnace and a pulling method for growing single crystal silicon. Background technique [0002] Crystalline silicon is an important raw material for silicon-based semiconductors and solar photovoltaic cells. At present, there are two main methods of growing crystalline silicon: one method is to place solid silicon material in an ingot furnace for ingot casting, and the product produced is polycrystalline silicon, which is mainly used for the manufacture of solar photovoltaic cells after slicing; The first method is to put solid silicon material in a single crystal furnace, and after melting, use the pulling method to grow single crystal silicon rods. Single crystal silicon wafers used in semiconductors and solar photovoltaic cells can be manufactured from single crystal silicon rods. In addition to the above two methods,...

Claims

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Application Information

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IPC IPC(8): C30B15/00C30B29/06
CPCC30B15/00C30B29/06
Inventor 夏高强范协诚银波王文胡颖罗飞飞宋高杰
Owner 新疆知信科技有限公司
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