Nano multilayered silicon nitride ceramic coating and preparation method and application thereof

A silicon nitride ceramic and nano-multilayer technology is applied in the field of silicon nitride coating and nano-multilayer ultra-thick silicon nitride ceramic coating, which can solve the overall performance decline of micro-crack coating and limit the service safety of the coating. and stability, difficult to prepare large samples, etc., to achieve the effect of no macroscopic defects, improved service safety, and small size restrictions

Active Publication Date: 2018-07-10
宁波海强装备科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, harmful gases are used in the CVD coating process, and the CVD chamber is not easy to prepare large samples, thus limiting the application of this technology
In addition, as a ceramic coating with wear-resistant, protective, and barrier functions, the existing single-layer structure usually leads to a decline in the overall performance of the coating due to the inevitable existence of microcracks, which greatly limits the service life of the coating. Security and Stability

Method used

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  • Nano multilayered silicon nitride ceramic coating and preparation method and application thereof
  • Nano multilayered silicon nitride ceramic coating and preparation method and application thereof
  • Nano multilayered silicon nitride ceramic coating and preparation method and application thereof

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preparation example Construction

[0035] One aspect of the embodiments of the present invention provides a method for preparing a nano-multilayer silicon nitride ceramic coating, which includes:

[0036] Provide the substrate;

[0037] Using single crystal silicon target and / or silicon nitride target as cathode, and using inert gas and nitrogen as working gas, using DC reactive sputtering technology and radio frequency sputtering technology to deposit and form the nanometer multilayer nitrogen on the substrate A silicon nitride ceramic coating, the nanometer multi-layer silicon nitride ceramic coating comprises alternately stacked DC reactive sputtering silicon nitride layers and radio frequency sputtering silicon nitride layers.

[0038] In some embodiments, the preparation method specifically includes:

[0039] (1) Provide substrate;

[0040] (2) cleaning the substrate by plasma sputtering;

[0041] (3) Using single crystal silicon target and / or silicon nitride target as cathode, and using inert gas and n...

Embodiment 1

[0077] Example 1 The nano-multilayer ultra-thick silicon nitride ceramic coating is a dense silicon nitride coating with a thickness of 24.3 μm deposited on a porous ceramic substrate. The coating has a hardness of 13.9 GPa and a plastic deformation rate of 65%.

[0078] The preparation process of the nanometer multi-layer ultra-thick silicon nitride coating is carried out according to the following steps:

[0079] (1) Plasma sputtering to clean the base material. First, use ethanol and acetone to ultrasonically clean the ceramic substrate. After drying, put it into the vacuum chamber of the magnetron sputtering equipment for argon plasma sputtering cleaning. The specific process is: argon gas flow rate 120sccm , bias voltage -500V, processing time 30min;

[0080] (2) DC reactive sputtering deposition of DC reactive sputtering silicon nitride coating (referred to as DC silicon nitride layer), the single crystal silicon target is selected as the cathode, and the vacuum chamber ...

Embodiment 2

[0090] Example 2 The nanometer multilayer ultra-thick silicon nitride ceramic coating (also known as silicon nitride-based sealing coating) is a dense silicon nitride coating with a thickness of 26.3 μm deposited on a porous ceramic substrate. The hardness is 11.6GPa, and the plastic deformation rate is 68%.

[0091] The preparation process of the nanometer multi-layer ultra-thick silicon nitride coating is carried out according to the following steps:

[0092] (1) Plasma sputtering to clean the base material. First, use ethanol and acetone to ultrasonically clean the ceramic substrate. After drying, put it into the vacuum chamber of the magnetron sputtering equipment for argon plasma sputtering cleaning. The specific process is: argon gas flow rate 120sccm , bias voltage -500V, processing time 30min;

[0093] (2) DC reactive sputtering to deposit silicon nitride coating, choose single crystal silicon target as cathode, vacuum chamber pressure is 8.0*10 - 1 Pa, the power of...

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Abstract

The invention discloses a nano multilayered silicon nitride ceramic coating and a preparation method and application thereof. The coating comprises a multilayered structure which is formed by direct-current reaction sputtering silicon nitride layers and radiofrequency sputtering silicon nitride layers which are alternately overlapped. The preparation method of the coating comprises the following step: depositing on a base material by taking a monocrystalline silicon target and / or a silicon nitride target as a cathode and taking inert gas and nitrogen as working gas and by a direct-current reaction sputtering technology and a radiofrequency sputtering technology to form the nano multilayered silicon nitride ceramic coating. The nano multilayered silicon nitride ceramic coating comprises direct-current reaction sputtering silicon nitride layers and radiofrequency sputtering silicon nitride layers which are alternately stacked. The nano multilayered silicon nitride ceramic coating is combined to a porous ceramic base material and the like well, has the advantages of compact structure, controlled thickness, high hardness, low internal stress, zero macroscopic defects and the like, andcan be applied to multiple fields of precise filtering and separation of various media, high-temperature wave transmitting / wave absorbing, electrolysis diaphragms and the like.

Description

technical field [0001] The invention relates to a silicon nitride coating, in particular to a nanometer multi-layer ultra-thick silicon nitride ceramic coating with high hardness, high binding force and high toughness, its preparation method and application, and belongs to the technical field of material surface treatment . Background technique [0002] Porous ceramic refers to a new type of ceramic material with a certain size and number of pore structures. Porous ceramics have a large number of evenly distributed through holes or closed pores inside, so porous ceramics have unique physical surface characteristics such as low bulk density and large specific surface. The above characteristics of porous ceramics can ensure its selective penetration, energy absorption or damping characteristics for liquids, gases, electromagnetic waves and other media, so it can be used in precision filtration and separation of various media, high-pressure gas exhaust silencer, high-temperatu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06
CPCC23C14/0036C23C14/0652C23C14/35
Inventor 刘二勇曾志翔王刚李龙阳蒲吉斌王立平
Owner 宁波海强装备科技有限公司
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