Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A water-washable letterpress photosensitive resin composition and its products

A resin composition and photosensitive resin technology, applied in printing plates, optics, opto-mechanical equipment, etc., can solve the problems of increasing process complexity, affecting printing quality, insufficient polymerization, etc., and achieving high dot reducibility and photosensitive wavelength range. Wide, fully cured effect

Active Publication Date: 2022-02-11
CHINA LUCKY FILM CORP
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, since the free radical photopolymerization of carbon-carbon double bonds is susceptible to oxygen inhibition, insufficient polymerization leads to sticky surfaces and affects printing quality
In order to overcome this shortcoming, vacuuming and later irradiating with ultraviolet light and heating and baking are usually used for debonding, which virtually increases the complexity of the process and has limited effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A water-washable letterpress photosensitive resin composition and its products
  • A water-washable letterpress photosensitive resin composition and its products
  • A water-washable letterpress photosensitive resin composition and its products

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example

[0044] S1 (2-mercaptoisobutyric acid modified hydrophilic polyamide resin)

[0045] Add 70 parts of 1,4-bis(γ-aminopropyl)piperazine adipate, 20 parts of ε-caprolactam, and 10 parts of deionized water into a stainless steel autoclave. After nitrogen replacement, seal it and slowly heat to 240°C, react for 2 hours, from internal pressure to 10kg / cm 2 , until the water vapor can no longer maintain the pressure, slowly return to normal pressure, and then react under normal pressure for 1h. After cooling down, add 5 parts of 2-mercaptoisobutyric acid to the reaction mixture, replace it with nitrogen, seal it, then slowly raise the temperature to 220°C, and react at this temperature for 2 hours to obtain a mercapto-modified hydrophilic polyamide resin . Then lower the temperature and cool down, add 40 parts of nylon 66 salt to the reaction mixture, replace with nitrogen, seal and slowly raise the temperature to 240°C, and react for 1 hour to obtain a mercapto-modified polyamide r...

Embodiment 1

[0051] The above-mentioned synthetic mercapto-modified water-based polyamide resin is formulated into a photosensitive resin composition according to the following formula:

[0052]

[0053]

Embodiment 2

[0055]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
softening pointaaaaaaaaaa
softening pointaaaaaaaaaa
Login to View More

Abstract

The invention discloses a water-washable letterpress photosensitive resin composition and its products. Its main feature is that the photosensitive resin is a hydrophilic polyamide resin modified by a mercapto compound, and the mercapto compound includes: alkyl mercaptan, sulfur Alcohol esters, aryl mercaptans, etc., use the mercapto groups and the ethylenic unsaturated bonds of the surrounding active monomers for photocuring during exposure, which can effectively overcome oxygen inhibition and simplify the steps of "debonding" and "post-exposure". On the other hand, the cracking-type and hydrogen-extracting-type compound photoinitiators are used in the resin composition, and the photosensitive wavelength ranges of different photoinitiators are fully utilized to complement each other and improve the utilization efficiency of ultraviolet light. The photosensitive resin composition prepared by the above method is applied in water-washing letterpress, and has good sensitivity, dot reduction ability and image-text flushability.

Description

technical field [0001] The invention relates to the field of flexographic printing, in particular to a photosensitive resin composition suitable for water-washing letterpress and a water-washing letterpress made from the resin composition. Background technique [0002] In the early 1980s, a washable photosensitive resin plate suitable for letterpress printing was successfully developed, which can produce high-quality printing results. The biggest advantage of the water-washed plate is that it can be cleaned with water, and the plate-making process is more environmentally friendly, and more and more people pay attention to it. [0003] Photosensitive resin is one of the most important components in water-washed plates, and its performance determines the performance of water-washed plates. The performance requirements of the photosensitive resin are mainly: it can be washed off with water when it is not exposed, it can be cross-linked and solidified after exposure, and it can...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004G03F7/09B41N1/12
CPCG03F7/004G03F7/027G03F7/09B41N1/12
Inventor 周健许剑姜伟李娜刘孟解雅玲赵伟建千昌富
Owner CHINA LUCKY FILM CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com