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Plasma Treatment Units and Showers

A plasma and processing device technology, applied in the field of plasma processing devices and nozzles, can solve problems such as unsuitable for large-scale

Active Publication Date: 2020-03-03
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The size of the dielectric window is also increased accordingly, but the dielectric material such as quartz constituting the dielectric window is brittle, so it is not suitable for the increase in size.

Method used

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  • Plasma Treatment Units and Showers
  • Plasma Treatment Units and Showers
  • Plasma Treatment Units and Showers

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Experimental program
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Embodiment Construction

[0037] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0038] First, a first embodiment of the present invention will be described.

[0039] figure 1It is a cross-sectional view schematically showing the configuration of an inductively coupled plasma processing apparatus as a plasma processing apparatus according to the first embodiment of the present invention.

[0040] figure 1 The shown inductively coupled plasma processing apparatus 10 performs etching of a metal film, an ITO film, an oxide film, etc., and ashing of a resist film when forming a thin film transistor on a substrate that is rectangular in plan view, such as a glass substrate for FPD. Plasma treatment, etc. Examples of the FPD include a liquid crystal display (LCD), an electroluminescence (EL) display, a plasma display panel (PDP), and the like.

[0041] The inductively coupled plasma processing apparatus 10 has a square tube-shaped airtight processing ...

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PUM

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Abstract

The present invention provides a plasma processing device and a shower head capable of performing uniform plasma processing on a substrate. The 24 split nozzles (13a~13x) divided from the nozzle (13) are divided into: the first division consisting of the segmented nozzles (13o, 13p, 13r, 13s, 13u, 13v, 13x and 13m) at the corners Nozzle group; The second divided nozzle group consisting of the divided nozzles (13n, 13q, 13t, 13w) located in the outer periphery; The third divided nozzle group composed of the divided nozzles (13a-13d) located near the center; The flow rate of the processing gas supplied to each divided showerhead group can be independently controlled in the fourth divided showerhead group composed of the divided showerhead groups 13e to 13l sandwiched between the three divided showerhead groups and the first divided showerhead group or the second divided showerhead group.

Description

technical field [0001] The present invention relates to a plasma processing apparatus and a shower head having a plurality of divided shower heads. Background technique [0002] In a manufacturing process of a flat panel display (FPD) such as a liquid crystal display device (LCD), a rectangular glass substrate in a planar view is subjected to plasma processing such as etching and film formation. In order to perform the above-mentioned plasma processing, various plasma processing apparatuses such as plasma etching apparatuses and plasma CVD apparatuses are used. As the plasma processing apparatus, an inductively coupled plasma (ICP) processing apparatus capable of obtaining high-density plasma in a high vacuum is suitably used. [0003] In a conventional inductively coupled plasma processing apparatus, a dielectric window corresponding to a glass substrate and having a rectangular shape in plan view is arranged between the high-frequency antenna and the processing chamber to...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32
CPCH01J37/32449H01L21/67017
Inventor 佐佐木和男藤井祐希
Owner TOKYO ELECTRON LTD
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