Manufacturing process of solar cell piece
A solar cell and manufacturing process technology, applied in the field of solar energy, can solve the problems of increasing cell cost, low efficiency, cumbersome production process, etc., and achieve the effect of simplifying production process, improving production efficiency, and helping development
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Embodiment 1
[0026] A process for manufacturing a solar cell, comprising the steps of:
[0027] S1. Inspection: Clean and inspect the silicon wafers to be processed, and remove unqualified silicon wafers;
[0028] S2. Texturing: put the tested qualified silicon wafers into alkaline solution for surface texturing treatment;
[0029] S3. Diffusion knot:
[0030] A1. Put the textured silicon wafer into the diffusion furnace. The temperature in the diffusion furnace is maintained at 800°C for 8 minutes. At the same time, a mixed gas of large nitrogen, oxygen and small nitrogen is introduced into the diffusion furnace. The flow rate of the small nitrogen is 3L / min, oxygen flow rate is 1L / min, maximum nitrogen flow rate is 8L / min;
[0031] A2. Raise the temperature in the diffusion furnace to 825°C, keep it warm for 10 minutes, and then feed the mixed gas of large nitrogen, oxygen and small nitrogen. The flow rate of the mixed gas is 15L / min, and the volume ratio of oxygen to the mixed gas is...
Embodiment 2
[0043] A process for manufacturing a solar cell, comprising the steps of:
[0044] S1. Inspection: Clean and inspect the silicon wafers to be processed, and remove unqualified silicon wafers;
[0045] S2. Texturing: put the tested qualified silicon wafers into alkaline solution for surface texturing treatment;
[0046] S3. Diffusion knot:
[0047] A1. Put the textured silicon wafer into the diffusion furnace. The temperature in the diffusion furnace is maintained at 805°C for 8 minutes. At the same time, a mixed gas of large nitrogen, oxygen and small nitrogen is introduced into the diffusion furnace, and the flow rate of the small nitrogen is 3.2L. / min, oxygen flow rate is 1.2L / min, maximum nitrogen flow rate is 8.5L / min;
[0048] A2. Raise the temperature in the diffusion furnace to 825°C, keep it warm for 12 minutes, and then feed the mixed gas of large nitrogen, oxygen and small nitrogen. The flow rate of the mixed gas is 18L / min, and the volume ratio of oxygen to the m...
Embodiment 3
[0060] A process for manufacturing a solar cell, comprising the steps of:
[0061] S1. Inspection: Clean and inspect the silicon wafers to be processed, and remove unqualified silicon wafers;
[0062] S2. Texturing: put the tested qualified silicon wafers into alkaline solution for surface texturing treatment;
[0063] S3. Diffusion knot:
[0064] A1. Put the textured silicon wafer into the diffusion furnace. The temperature in the diffusion furnace is maintained at 810°C for 8 minutes. At the same time, a mixed gas of large nitrogen, oxygen and small nitrogen is introduced into the diffusion furnace, and the flow rate of the small nitrogen is 3.5L. / min, oxygen flow rate is 1.4L / min, maximum nitrogen flow rate is 9L / min;
[0065]A2. Raise the temperature in the diffusion furnace to 825°C, keep it warm for 14 minutes, and then feed the mixed gas of large nitrogen, oxygen and small nitrogen. The flow rate of the mixed gas is 18L / min, and the volume ratio of oxygen to the mixe...
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Abstract
Description
Claims
Application Information
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