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Vanadium dioxide composite film and preparation method thereof

A vanadium dioxide and composite thin film technology, which is applied in the direction of superimposed layer plating, vacuum evaporation plating, coating, etc., can solve the problem of the decrease of the solar light regulation performance of the film, the reduction of the infrared light regulation performance of the film, and the near-infrared transmittance. Problems such as rising, achieving the effect of being suitable for large-area application, fast and stable large-area preparation, and short preparation cycle

Active Publication Date: 2018-05-11
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the infrared light regulation performance of the film is significantly reduced, the low-temperature near-infrared transmittance increases, the solar light regulation performance of the film decreases significantly, and the weather resistance of the film is unknown.

Method used

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  • Vanadium dioxide composite film and preparation method thereof
  • Vanadium dioxide composite film and preparation method thereof
  • Vanadium dioxide composite film and preparation method thereof

Examples

Experimental program
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Effect test

preparation example Construction

[0055] For the preparation of the functional layer, after the second protective anti-reflection layer is deposited, it can be directly sputter-deposited on the surface of the second protective anti-reflection layer, and then heat-treated at the same time. Alternatively, after the deposition of the second protective anti-reflection layer and the heat treatment are completed, the sputtering deposition of the functional layer can be performed, and finally a heat treatment process can be performed to complete the preparation.

[0056] As mentioned above, control the background vacuum to be higher than 5×10 -4 Pa. The purity of argon and oxygen used is above 99.9%.

[0057] In the present invention, the thin film deposition process is carried out at room temperature, which is relatively low in the preparation of vanadium dioxide thin film by magnetron sputtering, which is beneficial to improving energy utilization rate and reducing heat energy consumption. At the same time, the h...

Embodiment 1

[0065] Choose ordinary white glass as the base and cut it into a suitable size for later use;

[0066] Substrate cleaning: Rinse the substrate in deionized water, then ultrasonically clean the substrate with absolute ethanol for 10 minutes, dry it with a high-purity nitrogen gun, place it in the sample chamber, and fix it with high-temperature tape. Vacuuming: Use a mechanical pump and a molecular pump to evacuate the sample chamber and the sputtering deposition chamber. Sputtering deposition: Pass the mixed gas of argon and oxygen into the sputtering deposition chamber, control the total gas pressure at 1.0Pa, the ratio of oxygen partial pressure at about 40%, adopt intermediate frequency power supply, control the power supply current at 5A, and the power is optimal 2.0kw, using high-purity tungsten as the sputtering target, for sputtering deposition, the deposition time is 5min, and the first layer of WO is obtained 2.9 (x=0.1) Protect the AR coating layer. Then, adjust th...

Embodiment 2

[0069] As described in Example 1, on the basis of completing Example 1, control the partial pressure of oxygen to 40%, keep the total working pressure constant, use an intermediate frequency power supply, control the power supply current to 5A, and the power is preferably 2kw, using high-purity tungsten As the sputtering target, on the unannealed substrate / WO 2.9 / VO 2 Sputtering deposition on the composite thin film, the deposition time is 5min. Using the annealing process in Example 1, finally obtain the substrate (glass) / WO 2.9 / VO 2 / WO 2.9 Composite film (see image 3 center right). The thickness of the second protective anti-reflection layer was measured to be 45nm by scanning electron microscope section observation. The characterization of the thermal hysteresis loop at a fixed infrared wavelength shows that the substrate / WO prepared in this example 2.9 / VO 2 / WO 2.9 The phase transition temperature of the composite film is 54°C.

[0070] Using an infrared-vis...

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Abstract

The invention relates to a vanadium dioxide composite film and a preparation method thereof. The vanadium dioxide composite film comprises a base plate as well as a first protective transmission enhanced layer, a vanadium dioxide light-dimming layer and a second protective transmission enhanced layer which are sequentially formed on the surface of the base plate, wherein a chemical formula of thefirst protective transmission enhanced layer or / and the second protective transmission enhanced layer is WO3-x(x being greater than 0 and smaller than 0.9) or MyWO3 (y being greater than 0 and smallerthan or equal to 1), and M is at least one of Cs, Rb, K, Na, Li, Be, Mg, Ca, Sr and Ba. The vanadium dioxide composite film selects WO3-x or MyWO3 as the first protective transmission enhanced layerand the second protective transmission enhanced layer at the two sides of vanadium dioxide light-dimming layer. An optical constant n of WO3-x or MyWO3 is matched with that of the vanadium dioxide composite film, and n is equal to 2.0-2.4. The vanadium dioxide composite film can achieve optical design light-dimming.

Description

technical field [0001] The invention relates to a temperature-controlled intelligent thin-film vanadium oxide multilayer composite thin-film material and a preparation method thereof, belonging to the field of preparation of functional materials, in particular to a preparation method of a vanadium dioxide-based thin film with excellent light-adjusting performance, anti-reflection performance and weather resistance performance. Background technique [0002] The greenhouse effect leads to global warming, and the emission of greenhouse gases is becoming more and more serious. The development of clean energy and clean smart materials has become the common goal of all countries in the 21st century. my country's energy policy also clearly points out that high technology content and environmental pollution must be avoided. Less, economical, clean and safe development path. At present, buildings account for a large proportion of energy consumption, among which the most serious energy...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08C23C14/58
CPCC23C14/083C23C14/088C23C14/352C23C14/5806C23C28/042
Inventor 金平实龙世伟包山虎曹逊周怀娟
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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