Chip-level MEMS (micro electro mechanical system) rotation modulation gyroscope preparation method

A rotary modulation, chip-level technology, applied in the fields of inertial technology and micro-electromechanical systems, can solve the problems of high assembly precision requirements and difficult installation, and achieve the effect of small size

Active Publication Date: 2018-01-19
NORTHWESTERN POLYTECHNICAL UNIV
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Problems solved by technology

[0004] "A Self-calibration Method for Non-orthogonal Angles of Gimbals in Tri-axis Rotational Inertial Navigation System" and "ASelf-calibration Method for Tri-axis Rotational Inertial Navigation System" reported by Gao Pengyu et al., such as figure 1 As shown, using the rotation of the motor to modulate the output drift of a commercial micromachined gyroscope (inertial measurement unit) can significantly reduce the attitude error of the inertial system. However, the traditional assembly method of the motor, rotating frame and gyroscope makes the volume of the rotation modulation system almost cubic At the same time, this kind of system has problems such as difficult installation and high assembly accuracy requirements, while the processing and assembly methods based on MEMS technology have the characteristics of small size, high alignment accuracy, and batch manufacturing, which can effectively overcome the traditional rotary modulation. There are problems in the process of gyroscope preparation. At present, there is no public report on the preparation method of chip-level MEMS rotation modulation gyroscope.

Method used

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  • Chip-level MEMS (micro electro mechanical system) rotation modulation gyroscope preparation method
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  • Chip-level MEMS (micro electro mechanical system) rotation modulation gyroscope preparation method

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Embodiment Construction

[0026] In this embodiment, the preparation process of the chip-level MEMS rotary modulation gyroscope is as follows:

[0027] first step, Figure 4 As shown in (a), the glass sheet 1 is cleaned; the upper surface of the glass sheet 1 is coated with photoresist 2, and the thickness of photoresist 2 is 500nm;

[0028] second step, Figure 4 As shown in (b), photolithography, development, metal film 3 is sputtered on the surface of photoresist 2, the material of metal film 3 is gold, and the thickness is 200nm;

[0029] third step, Figure 4 As shown in (c), clean the SOI wafer 3, the crystal orientation of the SOI wafer 3 is , perform ICP dry etching on the base layer 4 of the SOI wafer 3, and the etching depth is 10 μm to obtain steps and the area of ​​the steps 500μm×500μm;

[0030] the fourth step, Figure 4 As shown in (d), remove the photoresist 2 on the upper surface of the glass sheet 1 to obtain the metal electrode 12 and the metal electrode 13; then clean the SOI w...

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Abstract

The invention relates to an MEMS (micro electro mechanical system) rotation modulation gyroscope chip preparation method and belongs to the field of inertial technologies and MEMS. During a preparation process, a micro-nano processing method is utilized to integrally process an MEMS gyroscope and a rotation modulation platform; thus, the shortcomings that an existing rotation modulation gyroscopehas a large volume, heaviness and complexity in assembling are overcome. The volume of the MEMS rotation modulation gyroscope prepared by the preparation method is only several cubic millimeters, andthe MEMS rotation modulation gyroscope has the characteristics of small volume, free assembling, batch manufacturing and the like.

Description

[0001] Field: [0002] The invention relates to a method for preparing a MEMS rotation modulation gyroscope chip, which is used for measuring the rotational angular rate of an object and obtaining the attitude information of the object, and belongs to the fields of inertial technology and micro-electromechanical systems (MEMS). Background technique: [0003] Gyroscope is an inertial device used to measure the angular rate of rotation of an object. It has important applications in navigation guidance, platform stability control, automotive industry, consumer electronics and other fields. Gyro output drift stability is a key factor affecting the error of inertial navigation system. At present, using the rotating platform to modulate the gyro output drift is an effective and fast method to significantly reduce the attitude error of the navigation system, and it has become an important research direction of the inertial navigation system. [0004] "A Self-calibration Method for N...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01C19/04
Inventor 申强苑伟政周金秋杨瑾谢建兵常洪龙
Owner NORTHWESTERN POLYTECHNICAL UNIV
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