Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer

A wear-resistant, high-hardness technology, applied in metal material coating process, coating, ion implantation plating, etc., can solve the problem of high resistance of carbon-based thin film, reduce the number of droplets, improve the quality and performance, The effect of easy temperature control

Inactive Publication Date: 2017-11-10
大连金泰正新科技有限公司
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the film itself has performance defects. This carbon-based film has high resistance and is not conductive, so it has limitations in many industries.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer
  • Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer
  • Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Step 1: Substrates are ultrasonically cleaned in a special solution for 20 minutes, and finally heated and dried with deionized water, alcohol, and a hair dryer;

[0024] Step 2: The substrate is installed on the vacuum equipment turntable, and the rotation speed is adjusted to 2.5r / min;

[0025] Step 3: Close the door of the vacuum equipment and vacuumize; when the pressure of the vacuum chamber reaches 5x10-2Pa, turn on the heater to heat;

[0026] Step 4: When the pressure of the vacuum chamber reaches 1X10-3Pa, the temperature is 50-100 degrees, argon gas is introduced, the ion source ionizes the inert gas, and the surface of the substrate is cleaned and activated with ions, and the current of the ion source is 10-20A;

[0027] Step 5: Turn off the ion source, turn on the bias voltage 300V, the duty cycle is 20%, turn on the magnetron target, the magnetron target current is 2-80A, and the titanium transition layer thickness is 200-300nm;

[0028] Step 6: Turn on th...

Embodiment 2

[0033] Step 1: Substrates are ultrasonically cleaned in a special solution for 20 minutes, and finally heated and dried with deionized water, alcohol, and a hair dryer;

[0034] Step 2: The substrate is installed on the vacuum equipment turntable, and the rotation speed is adjusted to 2.5r / min;

[0035] Step 3: Close the door of the vacuum equipment, evacuate, wait for the pressure of the vacuum chamber to be 5x10-2Pa, and turn on the heater to heat;

[0036] Step 4: When the pressure of the vacuum chamber reaches 1X10-3Pa, the temperature is 50-100 degrees, argon gas is introduced, the ion source ionizes the inert gas, and the surface of the substrate is cleaned and activated, and the current is 10-20A;

[0037] Step 5: Turn off the ion source, turn on the bias voltage 300V, the duty cycle is 20%, turn on the magnetron target, the magnetron target current is 10A, and the thickness of the titanium transition layer is 200-300nm;

[0038] Step 6: Turn on the ion source, the cur...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method for a conductive, anti-corrosive, wear-resistant and high-hardness carbon-based film. The preparation method comprises the following steps: heating by virtue of a heating pipe in a vacuum chamber; ionizing argon gas by virtue of an ion source; cleaning and activating a base material clamped on a rotating stand in the vacuum chamber; carrying out magnetic target deposition on titanium metal after a vacuum pressure is achieved; then carrying out acetylene ionization by virtue of the ion source; and finally cooling in an inert gas. The conductivity, anti-corrosive property, wear resistance, high hardness and other performance of the film prepared by the preparation method disclosed by the invention meet the application needs of many industries such as semiconductors, mobile phones, chemical electrolysis and electric spark machining.

Description

technical field [0001] The invention belongs to the technical field of thin film materials, and relates to a preparation method of a carbon-based thin film integrating conduction, corrosion resistance, wear resistance and high hardness. Background technique [0002] Material corrosion refers to the phenomenon that materials are damaged or deteriorated by the environment and lose their original functions. Corrosion pervades all walks of life, among which electrolytic corrosion is particularly serious and inevitable, and the cost of anti-corrosion is high, the waste of resources is serious, and the service life of workpieces is severely shortened. The diamond-like carbon film is mainly composed of sp3 carbon atoms of the diamond structure and sp2 carbon atoms of the graphite structure. It has many excellent properties such as corrosion resistance, wear resistance, high hardness and good chemical stability, and is almost insoluble in any Acids, bases and organic solutions. It...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/35C23C14/06C23C14/14
CPCC23C14/35C23C14/0605C23C14/14
Inventor 白春阳王俊波任睦琳
Owner 大连金泰正新科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com