Manufacturing method of array substrate and manufacturing method of display device

Abstract

The present invention provides a manufacturing method of an array substrate and a manufacturing method of a display device. According to the invention, when an isolation layer is manufactured, an isolation column is manufactured at the same time. The method specifically comprises the following steps of S1, forming an isolation layer, wherein the film of the isolation layer is made of organic materials; S2, patterning the film of the isolation layer to form a desired pattern and an isolation part of the isolation layer; S3, subjecting the isolation part to high-temperature treatment to increase the thickness of the isolation part and form an isolation column. According to the manufacturing method of the array substrate, not only the production period can be shortened, but also the production cost is reduced. Meanwhile, the generation of threshold voltage drift of a TFT due to the large-area ultraviolet irradiation can be avoided.

Description

Technical field [0001] The present invention relates to the field of display technology, in particular, to a manufacturing method of an array substrate and a manufacturing method of a display device. Background technique [0002] Organic light-emitting diode (OLED) display technology is widely used in mobile phones, digital video cameras, DVD players, personal digital assistants (PDAs), notebook computers, car stereos, TVs, and so on. Currently, OLED products are mainly realized through 9 mask steps. [0003] The structure of the existing flexible OLED mainly includes a substrate and a guiding film layer, a transition layer, an active layer, two gates, a connection layer, a source electrode and a drain electrode, a flat layer, an electrode layer, and an isolation layer sequentially arranged on the substrate. Layers and spacers. Among them, the manufacturing method of the above-mentioned flexible OLED is mainly through the photolithography process of 9 masks, which are the active ...

AI Technical Summary

Problems solved by technology

[0004] The production cycle of the above-mentioned flexible OLED manufacturing method is relatively long, resulting in an increase in production cost

Moreover, when making the isolation layer and the isolation column, due to the need for two photolithography processes, the energy of the second exposure is too large, resulting in a threshold voltage shift (Vth shift) of the TFT due to a large area of ​​ultraviolet radiation.

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