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Manufacturing method of diamond like carbon vibrating diaphragm and loudspeaker

A production method and technology of vibrating film, which is applied in the production of diamond-like carbon vibrating film and the field of loudspeakers, can solve the problems of complex process steps and devices, difficulty in guaranteeing adhesion, peeling off, etc., and achieve simplified process and excellent high-frequency performance Effect

Active Publication Date: 2017-08-01
1MORE ACOUSTIC TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the distorted sp in its molecular structure 3 The key has high internal stress, and the adhesion is often poor, which is prone to problems such as cracking and peeling
[0003] The existing DLC ​​film production methods mostly use plasma-assisted chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) and physical vapor deposition (Physical Vapor Deposition, PVD). The traditional plasma-assisted chemical vapor deposition requires high temperature, vacuum Traditional physical vapor deposition needs to be carried out under vacuum conditions. The process steps and devices are complicated, and the thermal stress residue leads to poor adhesion of the diamond-like carbon film. It is often necessary to set up an interposer or add other elements to carry out the diamond-like carbon film. The deposition of carbon film can solve the problem of poor adhesion, which increases the process steps, and the adhesion is difficult to guarantee

Method used

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  • Manufacturing method of diamond like carbon vibrating diaphragm and loudspeaker
  • Manufacturing method of diamond like carbon vibrating diaphragm and loudspeaker
  • Manufacturing method of diamond like carbon vibrating diaphragm and loudspeaker

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0042] A voltage of 6.5 kilovolts is provided, and a distance of 1.5 centimeters is maintained between the outlet 332 of the nozzle 33 of the atmospheric pressure plasma chemical vapor deposition device and the substrate 1, which can dissociate more than 95% of the carbon-containing gas, and the carbon ion in the plasma state Density reaches about 10 12 , scanning moving speed 200mm / s, scanning back and forth, the thickness of the formed DLC film is 20 nanometers, scanning two back and forth, the thickness of the formed DLC film is 40 nanometers, scanning three back and forth, the thickness of the formed DLC film is 60 nanometers Nano.

specific Embodiment approach 2

[0044] A voltage of 5 kV is provided, and a distance of 1.5 centimeters is maintained between the outlet 332 of the nozzle 33 of the atmospheric pressure plasma chemical vapor deposition device and the substrate 1, which can dissociate more than 90% of the carbon-containing gas, and the carbon ion in the plasma state The density reaches about 10 11 , scanning moving speed 150mm / s, scanning back and forth, the thickness of the formed DLC film is 20 nanometers, scanning two back and forth, the thickness of the formed DLC film is 40 nanometers, scanning three back and forth, the thickness of the formed DLC film is 60 nanometers Nano.

specific Embodiment approach 3

[0046] A voltage of 10 kV is provided, and a distance of 1.5 centimeters is maintained between the outlet 332 of the nozzle 33 of the atmospheric pressure plasma chemical vapor deposition device and the substrate 1, which can dissociate about 99% of the carbon-containing gas, and the carbon ion in the plasma state Density reaches about 10 13 , scanning moving speed 250mm / s, scanning back and forth, the thickness of the formed diamond-like carbon film is 20 nanometers, scanning two back and forth, the thickness of the formed diamond-like carbon film is 40 nanometers, scanning three back and forth, the thickness of the formed diamond-like carbon film is 60 nanometers Nano.

[0047] In this embodiment, the thickness of the substrate 1 is between 9 microns and 50 microns. If it is lower than 9 microns, the substrate is easily broken down during the coating process; if it is higher than 50 microns, it is not suitable for use as a diaphragm.

[0048] The relationship between the t...

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Abstract

A manufacturing method of a diamond like carbon vibrating diaphragm of the present invention comprises a step of placing a base material in the air, wherein the base material is a high polymer material. A step of depositing the diamond like carbon vibrating diaphragm comprises on a temperature condition of less than 90 DEG C, importing a carbon-containing gas from one end of an atmospheric pressure plasma chemical vapor deposition device, and providing a voltage more than 5 kV and less than 10 kV to ionize the carbon-containing gas, importing a main gas from the other end of the atmospheric pressure plasma chemical vapor deposition device, bringing out the ionized carbon-containing gas out of the atmospheric pressure plasma chemical vapor deposition device by the main gas and depositing on the surface of the base material to form the diamond like carbon vibrating diaphragm. A step of forming the diamond like carbon vibrating diaphragm comprises cutting the diamond like carbon vibrating diaphragm having the needed diameter from the diamond like carbon vibrating diaphragm, forming the diamond like carbon vibrating diaphragm having the needed shape by a compressing technology; or compressing on the diamond like carbon vibrating diaphragm by the compressing technology to form the diamond like carbon vibrating diaphragm having the needed shape and diameter, and cutting the diamond like carbon vibrating diaphragm. Compared with the conventional manufacturing method of the plasma enhanced chemical vapor deposition and the physical vapor deposition, the manufacturing method of the diamond like carbon vibrating diaphragm of the present invention can deposit the diamond like carbon vibrating diaphragm in the atmospheric pressure and low temperature environments without needing to setting a vacuum cavity and a vacuum device, and enables the processes to be simplified. Moreover, in the low temperature environment, the diaphragm break caused by the high temperature or the diaphragm wrinkling caused by the thermal deformation can be avoided, and the formed diamond like carbon vibrating diaphragm is more flat.

Description

technical field [0001] The invention relates, in particular, to a manufacturing method of a diamond-like carbon diaphragm and a loudspeaker. Background technique [0002] Diamond Like Carbon (DLC) technology was developed in the early 1970s. It is essentially a hydrogen-containing amorphous carbon film. Due to its properties similar to natural diamonds, such as high hardness, good corrosion resistance, and surface Smooth, low friction coefficient, good wear resistance, good biocompatibility, etc., so it is used on the horn diaphragm to extend the high frequency. However, due to the distorted sp in its molecular structure 3 Bonds have high internal stress, poor adhesion, and are prone to problems such as cracking and peeling. [0003] The existing DLC ​​film production methods mostly use plasma-assisted chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) and physical vapor deposition (Physical Vapor Deposition, PVD). The traditional plasma-assisted ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H04R31/00H04R9/06
CPCH04R9/06H04R31/003C23C16/26C23C16/45595C23C16/503C23C16/513H04R7/02H04R2307/023H04R2307/025C23C16/50H04R9/025
Inventor 邱士嘉杨磊
Owner 1MORE ACOUSTIC TECH CO LTD
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