Efficient thermoelectric conversion characteristic ZnSb based thin film and preparing method thereof
A thermoelectric conversion and thin film technology, applied in vacuum evaporation coating, coating, sputtering coating and other directions, can solve the problem of low thermoelectric characteristics of ZnSb-based thin films, and achieve the effect of improving thermoelectric characteristics and optimizing film structure
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Embodiment 1
[0038] The ZnSb-based thin film was prepared by magnetron co-sputtering technology. First, the Sb and Zn targets with a purity of 99.99% were respectively fixed on the two station target racks of the sputtering system; BK7 optical glass was used as the substrate, and the BK7 The optical glass is placed in a container and ultrasonically cleaned with acetone, alcohol and deionized water in sequence; the background vacuum of the sputtering system is pumped to 6.0×10 -4 Pa, the inlet flow rate is 6sccm high-purity Ar gas, and the working pressure is controlled at 6.0×10 -2 Pa; increase the power of the magnetron sputtering system to deposit Sb and Zn on the BK7 optical glass, and the co-sputtering deposition time is 30min.
[0039] After the deposition is completed, the ZnSb-based thin film sample is fixed on the bombardment station frame of the plasma beam bombardment system; the vacuum degree of the plasma beam bombardment system is pumped to 6.0×10 -4 Pa, the flow rate is 10 s...
Embodiment 2
[0042] The difference from Example 1 is that the plasma beam is replaced by nitrogen gas.
Embodiment 3
[0044] The difference from Example 1 is that the plasma beam energy is changed to 0.1 KeV.
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