A kind of method of epitaxial growth yttrium iron garnet nano film
A technology of yttrium iron garnet and epitaxial growth, which is applied in the fields of nanostructure application, magnetic film to substrate application, cathode sputtering application, etc. It can solve the problems of simultaneous realization of nanometer thickness and perpendicular magnetic anisotropy, and achieve high Effect of Induced Magnetic Anisotropy
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Embodiment 1
[0029] The steps adopted in this embodiment are as follows:
[0030] 1. Preparation of high-purity yttrium iron garnet (Y 3 Fe 5 o 12) and samarium gallium garnet (Sm 3 Ga 5 o 12 ) target. Set the distance between the target and the substrate as 6cm (this distance will affect the deposition rate). Place the SGGG substrate in a vacuum better than 4×10 -4 Pa vacuum chamber heated to 800-900 ℃ pretreatment.
[0031] 2. Fill the vacuum chamber with high-purity oxygen and adjust the air pressure to 20Pa;
[0032] 3. Under the condition that the substrate is 800-950°C, adjust the laser energy density to about 1.8J / cm 2 , with a pulse frequency of 6 Hz, using a focused pulsed laser beam to bombard a pre-fired samarium gallium garnet target to deposit a buffer layer. The growth thickness of the buffer layer was controlled to 2.5 nm by the number of laser pulses. In-situ annealing was performed for 30 minutes after deposition.
[0033] 4. Under the same conditions as in the...
Embodiment 2
[0037] The steps adopted in this embodiment are as follows:
[0038] 1. Preparation of high-purity yttrium iron garnet (Y 3 Fe 5 o 12 ) and samarium gallium garnet (Sm 3 Ga 5 o 12 ) target. Set the distance between the target and the substrate as 6cm (this distance will affect the deposition rate). Place the SGGG substrate in a vacuum better than 4×10 -4 Pa vacuum chamber heated to 800-900 ℃ pretreatment.
[0039] 2. Fill the vacuum chamber with high-purity oxygen and adjust the air pressure to 20Pa;
[0040] 3. Under the condition that the substrate is 800-950°C, adjust the laser energy density to ~2J / cm 2 , with a pulse frequency of 6 Hz, using a focused pulsed laser beam to bombard a pre-fired samarium gallium garnet target to deposit a buffer layer. The growth thickness of the buffer layer was controlled to 2.5 nm by the number of laser pulses. In-situ annealing was performed for 30 minutes after deposition.
[0041] 4. Under the same conditions as the previous...
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