Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Silicon dioxide adsorption agent modified by zero-valent iron/chitosan and preparation method and application thereof

A technology of silica and chitosan, which is applied in the direction of silica, silica, chemical instruments and methods, etc., can solve the problems of environmental secondary pollution, etc., and achieve large adsorption capacity, short treatment cycle and simple operation method Effect

Active Publication Date: 2016-11-16
辽宁岩海牧业有限公司
View PDF6 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] So far, there are many ways to remove arsenic. At present, the main arsenic removal technologies at home and abroad include: biological method, vulcanization method, coagulation method, ion exchange method, polymer adhesive and membrane technology, direct precipitation method, photocatalytic method, etc. These arsenic removal technologies and methods have their own advantages and disadvantages and scope of application, and some arsenic removal methods can only be applied to arsenic removal in the laboratory
Most of these methods have the advantages of low price and good arsenic removal effect; but their disadvantages are the problems caused by the treatment of toxic sludge and the secondary pollution to the environment during the treatment process.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silicon dioxide adsorption agent modified by zero-valent iron/chitosan and preparation method and application thereof
  • Silicon dioxide adsorption agent modified by zero-valent iron/chitosan and preparation method and application thereof
  • Silicon dioxide adsorption agent modified by zero-valent iron/chitosan and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Example 1 A zero-valent iron / chitosan modified silica adsorbent (Fe 0 -CS-SiO 2 )

[0028] (1) The preparation method is as follows

[0029] Dissolve 2g of chitosan into 100mL of acetic acid solution with a concentration of 2% (v / v), then add 30mL TEOS to the above solution, stir magnetically for 30min at room temperature, then add 200mL of TEOS with a concentration of 3% (v / v) ammonia water, stirred at room temperature for 24 h, filtered the resulting suspension, discarded the filtrate, and washed the residue with distilled water until it reached neutrality to obtain the intermediate product CS-SiO 2 .

[0030] 0.5g CS-SiO 2 Add to a 250mL three-neck flask, add 10mL of water, under N 2 Under protection, it was stirred under magnetic force at 80°C for 15 minutes, and then weighed 4.5g FeSO 4 ·7H 2 O (mass ratio 1:9) was added to the above solution, and after stirring for 30 minutes, 50 mL, 0.5 mol L -1 NaBH 4 , and reacted at 80°C for 4h, then filtered and drie...

Embodiment 2

[0035] Example 2 A zero-valent iron / chitosan modified silica adsorbent (Fe 0 -CS-SiO 2 )

[0036] Method is the same as embodiment 1, selects FeSO 4 ·7H 2 O and CS-SiO 2 The mass ratios are 1:7, 1:8, 1:9, 1:10, 1:11, respectively. As shown in Table 1, the adsorption rates of the five synthesized adsorbents for As(III) under the condition of pH=4 were 89.1%, 100%, 98.9%, 100%, and 99.6%, respectively. It can be seen that FeSO 4 ·7H 2 O and CS-SiO 2 When the mass ratio is in the range of 1:8-1:11, the adsorption performance of As(III) is high.

[0037] Table 1 Different FeSO 4 ·7H 2 O and CS-SiO 2 Effect of ratio on the adsorption effect of As(III)

[0038]

Embodiment 3

[0039] Example 3 Fe under different solution acidity conditions 0 -CS-SiO 2 Adsorption performance of adsorbents for As(III)

[0040] 10mg Fe 0 -CS-SiO 2 The adsorbent is mixed with 10mL of 20ppm As(III) solution with different pH (pH=1, 2, 3, 4, 6, 8, 9, 10, 11, 12); ℃ shaking for 24h.

[0041] The adsorption rate was measured as image 3 ,Depend on image 3 Visible, Fe 0 -CS-SiO 2 When the adsorbent is at pH4-pH9, the maximum adsorption rate of As(III) is greater than 98%. It can be seen that under the condition of pH=4~9, Fe 0 -CS-SiO 2 The adsorbent extracts As(III) from the solution.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a silicon dioxide adsorption agent modified by zero-valent iron / chitosan and a preparation method and application thereof. Chitosan solution is dissolved into acetic acid; TEOS (tetraethyl orthosilicate) is added; the mixture is stirred for 25 to 35 min at the room temperature; ammonium hydroxide is added; the mixture is stirred for 22 to 24h at the room temperature; obtained suspension liquid is filtered and is washed to the neutral state to obtain an intermediate product CS-SiO2; the CS-SiO2 is added into water; under the conditions of N2 protection and the temperature being 75 to 85 DEG C, magnetic stirring is performed for 10 to 20 min; FeSO4 7H2O is added; the stirring is continuously performed for 25 to 35 min; NaBH4 is dripped; the reaction is performed for 3 to 5h at 75 to 85 DEG C; filtering and drying are performed to obtain a target product. The FeO-CS-SiO2 adsorption agent prepared by the method has the advantages that As(III) can be efficiently separated and enriched from material liquid containing impurity ions; the environment is protected; the energy is saved; no energy source consumption exists; the preparation method is simple; the cost is low; the practical applicability is realized.

Description

technical field [0001] The invention belongs to the field of green adsorbent preparation and sewage treatment, in particular to a kind of silica modified with zero-valent iron / chitosan as an adsorbent, which is selectively recovered from a feed liquid containing As(III) ions and impurity ions As(III) method. Background technique [0002] Arsenic in the earth's crust and man-made arsenic pollution can seep into groundwater from rock formations and soil, and can also be absorbed by plants into the food chain and participate in biogeochemical cycles. Arsenic exists in a stable, poorly mobile form, usually in the earth's crust and rocks. In the aquatic environment, the form of arsenic depends on its environmental conditions. Under oxidizing conditions, arsenic mainly exists in the form of arsenate, while under reducing conditions, it mainly exists in the form of arsenite. [0003] So far, there are many ways to remove arsenic. At present, the main arsenic removal technologies...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/24B01J20/30B01D15/00C02F1/28C01B33/12C02F101/10
CPCB01D15/00B01J20/0229B01J20/103B01J20/24C01B33/124C02F1/288C02F2101/103Y02P20/50
Inventor 熊英佟强娄振宁单炜军
Owner 辽宁岩海牧业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com