Preparation method for synchronous-grown wafer-level AB-stack double-layer graphene and equipment for preparation method
A double-layer graphene stacking technology, applied in the field of graphene, can solve the problems of low mobility, complex time-consuming process, and many defects in double-layer graphene, and achieve the effect of simple operation and convenient control
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0034] like figure 1 As shown, a copper foil 2 is provided in the reactor 1, and at the same time, an inert carrier gas 3 containing a high hydrogen partial pressure is passed through the reactor 1, and the inlet end of the reactor is connected to a solid or liquid carbon source device 4; The copper foil 2 is provided with a heating device. 5 is a mechanical pump among the figure.
[0035] The following is an example of a solid carbon source.
[0036] ⑴. Select copper foil (Alfa Aesar, 99.8% purity, 25 μm thickness), cut it into a size of 10cm*10cm (the size of copper foil is completely determined by the size of the reaction chamber), soak it in acetic acid solution for 10 hours, and blow it with nitrogen After drying, roll it into a roll and put it into the reaction chamber;
[0037] ⑵. Hydrocarbons are made of polystyrene (Mw: 25000) and placed in a quartz vessel at one end of the gas source;
[0038] ⑶. Inject 10% H 2 / Ar mixed gas, flow 400sccm, to figure 2The heati...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com