Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Layered structure, switching element, magnetic device, and method for manufacturing layered structure

A technology of switching elements and manufacturing methods, applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve problems such as difficulty in magnetization orientation, achieve power saving, easy control, and increase recording density.

Inactive Publication Date: 2016-10-26
TOKYO INST OF TECH
View PDF8 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since a single-layer magnetic film is used as a magnetic thin film, and a large electric field of megaunits (MV / cm) or more is required for electrically controlling the coercive force of perpendicular magnetization, complete switching of magnetization orientation by voltage is difficult

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Layered structure, switching element, magnetic device, and method for manufacturing layered structure
  • Layered structure, switching element, magnetic device, and method for manufacturing layered structure
  • Layered structure, switching element, magnetic device, and method for manufacturing layered structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0094] Next, an example of a laminated structure according to an embodiment of the present invention will be described. The laminated structure as an example of this embodiment has a multiferroic structure of ferromagnetic / nonmagnetic multilayer film / ferroelectric, and consists of [Cu / Ni] multilayer film / Cu intermediate layer / Fe base layer / BaTiO 3 Single crystal composition. In this example, the [Cu / Ni] multilayer film with 5 cycles and BaTiO 3 The Fe base layer and the Cu intermediate layer are inserted between them, resulting in the formation of a [Cu / Ni] multilayer film on BaTiO 3 structure obtained by epitaxial growth. As a result, the ferroelectric BaTiO can be efficiently transferred through the joint interface of the [Cu / Ni] multilayer film. 3 piezoelectric strain.

[0095] For the manufacturing method of the stacked structure of this embodiment, first, using an ultra-high vacuum MBE device, a single crystal BaTiO having an in-plane-vertical dielectric multipolariza...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

This invention produces more stable perpendicular magnetization and makes it possible to use a voltage to switch between perpendicular magnetization and in-plane magnetization. This multiferroic layered structure (10), which exhibits both ferroelectricity and ferromagnetism, is characterized by having the following: a ferroelectric layer (11) comprising a ferroelectric material that exhibits ferroelectricity; an underlayer (12) that is laminated to one surface of the ferroelectric layer and consists primarily of a metal that is lattice-matched to the aforementioned ferroelectric material; an intermediate layer (13) that is laminated to one surface of the underlayer and consists primarily of a non-magnetic material; and a ferromagnetic / non-magnetic multilayer-film layer (14) that is laminated to one surface of the intermediate layer and comprises three or more pairs of alternating ferromagnetic layers (15) each consisting primarily of a ferromagnetic material and non-magnetic layers (16) each consisting primarily of a non-magnetic material.

Description

technical field [0001] The present invention relates to a multiferroic multiferroic structure having both ferroelectricity and ferromagnetism, a switching element including the multiferroic structure, a magnetic device including the switching element, and a method for manufacturing the multiferroic structure. This application claims priority based on Japanese Patent Application No. Japanese Patent Application No. 2014-036216 for which it applied in Japan on February 27, 2014, and takes this application in this application by reference. Background technique [0002] Conventionally, as a method for controlling the magnetization orientation of magnetic devices such as a magnetoresistive random access memory (MRAM), a magnetic head, and a spin transistor, a method using a magnetic field has been the mainstream. In addition, in recent years, attempts have been made to realize this magnetization orientation control by using an electric current to increase the density of magnetic d...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01F10/28H01F10/14H01L21/8246H01L27/105H01L29/82
CPCH01L29/66984H01L29/423H01L29/42372H01F10/3236H10N50/85H10N50/80H01F10/14H01F10/324H01F41/22
Inventor 谷山智康白幡泰浩椎名亮太
Owner TOKYO INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com