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Method for chemical vapor reaction deposition of transparent hydrophobic easy-to-clean thin film

A chemical gas phase reaction, easy-to-clean technology, applied in the direction of coating, etc., can solve the problems that are not suitable for industrial mass production, high cost, slow deposition rate, etc., and achieve good promotion and application prospects, reduce production costs, and fast deposition speed effect

Active Publication Date: 2016-09-14
南通斐腾新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing parylene HT type has an octafluoro structure, although it has good transparency, low friction coefficient and hydrophobicity, but its cost is high, and the deposition rate is slow, and the surface temperature of the workpiece needs to be controlled at about zero degrees Celsius, which is not suitable for industrial mass production

Method used

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  • Method for chemical vapor reaction deposition of transparent hydrophobic easy-to-clean thin film
  • Method for chemical vapor reaction deposition of transparent hydrophobic easy-to-clean thin film
  • Method for chemical vapor reaction deposition of transparent hydrophobic easy-to-clean thin film

Examples

Experimental program
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Effect test

Embodiment 1

[0032] The raw material is 6-fluorine-1-chloro-p-xylene as raw material. First, mix trimethylchlorosilane with nano-magnesium powder or magnesium fluoride, pour it into N,N-dimethylformamide, and then mix 6-fluoro-1-chlorine P-xylene was added dropwise, stirred magnetically at room temperature under an argon atmosphere for 20 minutes to react, then terminated the reaction by adding deionized water, extracted with hexane, dehydrated with anhydrous magnesium sulfate, and then obtained by suction filtration Colorless and transparent solution 5 fluorine 1 chlorosilane p-xylene.

[0033] Use the precursor synthesized in the first step to carry out the second catalytic reaction, using cesium fluoride as the catalyst, mix the precursor of the first step with cesium fluoride and pour it into anisole, and then heat the liquid to 160 degrees Celsius to carry out After condensing and refluxing for 24 hours, the cooled mixed liquid was subjected to suction filtration, and the filtered liq...

Embodiment 2

[0037] The raw material is 6-fluoro-1 chloro-p-xylene as the source material. Firstly, after mixing trimethylchlorosilane with nano-magnesium powder or magnesium fluoride, it is poured into N,N-dimethylformamide, and then 6-fluoro-1 Chloro-p-xylene was added dropwise, and the reaction was carried out under argon atmosphere with magnetic stirring at room temperature for 30 minutes, and then the reaction was terminated by adding deionized water, extracted with hexane, dehydrated with anhydrous magnesium sulfate, and then suction filtered A colorless and transparent solution of 5-fluoro-1-chlorosilyl-p-xylene was obtained.

[0038] Use the precursor synthesized in the first step to carry out the second catalytic reaction, using cesium fluoride as the catalyst, mix the precursor of the first step with cesium fluoride and pour it into anisole, and then heat the liquid to 160 degrees Celsius to carry out After condensing and refluxing for 24 hours, the cooled mixed liquid was subjec...

Embodiment 3

[0042]The raw material is 6-fluoro-1 chloro-p-xylene as the source material. Firstly, after mixing trimethylchlorosilane with nano-magnesium powder or magnesium fluoride, it is poured into N,N-dimethylformamide, and then 6-fluoro-1 Chloro-p-xylene was added dropwise, and the reaction was carried out under argon atmosphere with magnetic stirring at room temperature for 25 minutes, and then the reaction was terminated by adding deionized water, extracted with hexane, dehydrated with anhydrous magnesium sulfate, and then suction filtered A colorless and transparent solution of 5-fluoro-1-chlorosilyl-p-xylene was obtained.

[0043] Use the precursor synthesized in the first step to carry out the second catalytic reaction, using cesium fluoride as the catalyst, mix the precursor of the first step with cesium fluoride and pour it into anisole, and then heat the liquid to 160 degrees Celsius to carry out After condensing and refluxing for 24 hours, the cooled mixed liquid was subject...

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Abstract

The invention relates to a method for chemical vapor reaction deposition of a transparent hydrophobic easy-to-clean thin film, wherein the method comprises preparation of a precursor, preparation of an octafluoro dichloro p-dimethylbenzene dimer and chemical vapor reaction deposition of the thin film. The method takes hexafluoro monochloro paraxylene as a main raw material, and the production cost is reduced; the method is suitable for plastics and metal surface plating films, has the advantages of simpliness, high efficiency, fast deposition speed, and industrialized mass production; the obtained Parylene HT plating film is transparent, hydrophobic and easy to clean, and has good promotion and application prospects.

Description

technical field [0001] The invention relates to the technical field of surface treatment, in particular to a method for chemical vapor phase reaction deposition of a transparent hydrophobic and easy-to-clean film. Background technique [0002] With the wide popularization of electronic products and automobiles, the performance requirements of plastic and metal surfaces are getting higher and higher, and people have more and more demands for easy-to-clean and smooth surfaces. Cleaning, reducing coefficient of friction, improving wear resistance and anti-fingerprint effects. [0003] At present, methods for preparing transparent hydrophobic films on surfaces include self-assembly methods, physical adsorption methods, and electrochemical methods. For example, Chinese invention patent application CN 101091947A uses a self-assembly method to construct a super-hydrophobic surface through a self-assembly reaction process of more than 2 days on the copper surface. However, the pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D165/00C08G61/12
CPCC08G61/121C08G2261/11C08G2261/146C08G2261/344C09D165/00
Inventor 吴子豹王斐
Owner 南通斐腾新材料科技有限公司
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