Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A mask-based projection objective lens performance testing device and method

A technology of projection objective lens and testing device, which is applied in testing optical performance, exposure device of photo-plate making process, photography, etc. It can solve the problems of uncertain actual optical axis of objective lens and unusability, so as to reduce the difficulty of splicing, reduce requirements, and increase feasibility sexual effect

Active Publication Date: 2018-12-14
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method needs to adjust the optical axis of the measuring device and the objective lens to be parallel in advance.
But for the objective lens with adjustable image plane position, the actual optical axis of the objective lens is uncertain, so this method cannot be used

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A mask-based projection objective lens performance testing device and method
  • A mask-based projection objective lens performance testing device and method
  • A mask-based projection objective lens performance testing device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0045] The present invention provides a mask-based projection objective lens performance test device and a test method, which can achieve the following three improvements compared with the current testing technology: 1) It can determine whether the object image plane of the objective lens is ideal in spatial position Conjugate, and can test to obtain the deviation; 2) Since the reference measurement is used, the influence of the mask surface shape, mark processing and manufacturing errors, standard wavefront errors, and inherent systematic errors in the measurement components on the measurement accuracy can be eliminated , so the measurement accuracy of the basic performance of the objective lens has been improved; 3) To measure the absolute telecentricity of the objective lens, the measurement method is simple and the accuracy is high.

[004...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
reflectanceaaaaaaaaaa
Login to View More

Abstract

The invention discloses a performance test device for a projection objective lens based on a mask plate. The test device comprises a mask platform assembly, a mask platform aligning assembly and a mark detection assembly, wherein a mark array of the mask plate is imaged by the projection objective lens to form mark image points via the mask platform assembly, the mask platform aligning assembly is used to align and install the mask platform assembly, and the mark detection assembly is used to measure the mark array and mark image points of the mask plate to obtain wavefront information of the projection objective lens.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a test and calibration platform applied to projection objective lenses. Background technique [0002] With the rapid development of the semiconductor industry, the market demand for more refined and large-capacity lithography machine products is becoming more and more urgent. One of the effective ways to increase the productivity of lithography machines is to expand the exposure field of view. However, limited by the size of the high-uniformity glass material, a single objective lens cannot infinitely expand the exposure field of view under the premise of high-precision imaging. The splicing objective lens can solve this problem very well. Among them, there is a splicing objective lens composed of multiple +1X sub-objective lenses (groups), which can theoretically achieve infinite expansion of the field of view. But before splicing, each sub-objective ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02G03F9/00G03F7/20
Inventor 李天鹏何经雷
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com