Method for preparing CIGS thin-film solar cell absorption layer employing co-sputtering method
A solar cell and co-sputtering technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of CIGS absorption layer stoichiometric ratio deviation, low indium sputtering efficiency and other problems, and is conducive to large-scale industrial production. , the effect of surface uniformity, enhancement of completeness and crystallinity
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Embodiment 1
[0016] A kind of co-sputtering method prepares the method for absorbing layer of CIGS thin-film solar cell, comprises the following steps: 1. provides the soda lime glass substrate of molybdenum plating, adopts copper indium gallium selenide target to carry out radio frequency sputtering, adopts indium target to carry out DC sputtering at the same time, The copper indium gallium selenide prefabricated layer was prepared by co-sputtering; the process conditions of co-sputtering are: the vacuum degree of the bulk reaches 8×10 -4 Below Pa, during the sputtering process, the target distance is maintained at 8 cm, the argon gas flow rate is 20 sccm, the substrate rotation speed is 20 r / min, the working pressure is 0.5 Pa, and the co-sputtering time is 120 min. The copper indium gallium selenide target The RF sputtering power of the indium target is 110 W, and the power of the indium target DC sputtering is 70 W; ②Put the prefabricated copper indium gallium selenium layer into a rapi...
Embodiment 2
[0021] A kind of co-sputtering method prepares the method for absorbing layer of CIGS thin-film solar cell, comprises the following steps: 1. provides the soda lime glass substrate of molybdenum plating, adopts copper indium gallium selenide target to carry out radio frequency sputtering, adopts indium target to carry out DC sputtering at the same time, The copper indium gallium selenide prefabricated layer was prepared by co-sputtering; the process conditions of co-sputtering are: the vacuum degree of the bulk reaches 7×10 -4 Below Pa, during the sputtering process, the target distance is maintained at 8 cm, the argon gas flow rate is 20 sccm, the substrate rotation speed is 20 r / min, the working pressure is 0.5 Pa, and the co-sputtering time is 120 min. The copper indium gallium selenide target The RF sputtering power of the indium target is 110 W, and the power of the indium target DC sputtering is 70 W; ② Put the prefabricated layer of copper indium gallium selenium into a ...
Embodiment 3
[0024] A kind of co-sputtering method prepares the method for absorbing layer of CIGS thin-film solar cell, comprises the following steps: 1. provides the soda lime glass substrate of molybdenum plating, adopts copper indium gallium selenide target to carry out radio frequency sputtering, adopts indium target to carry out DC sputtering at the same time, The copper indium gallium selenide prefabricated layer was prepared by co-sputtering; the process conditions of co-sputtering are: the vacuum degree of the bulk reaches 8×10 -4 Below Pa, during the sputtering process, the target distance is maintained at 8 cm, the argon gas flow rate is 20 sccm, the substrate rotation speed is 20 r / min, the working pressure is 0.5 Pa, and the co-sputtering time is 120 min. The copper indium gallium selenide target The RF sputtering power of the indium target is 110 W, and the power of the indium target DC sputtering is 70 W; ②Put the prefabricated copper indium gallium selenium layer into a rapi...
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