Preparation method of In-doped MoO3 thin film and application of thin film in QLED
A technology of thin film and indium salt, which is applied in the field of flat panel display, can solve the problems of affecting charge transport and injection, inapplicability, etc., and achieve the effects of reducing injection barrier, improving efficiency, good energy level matching and applicability
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[0020] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0021] combine figure 1 , the embodiment of the present invention provides an In-doped MoO 3 The preparation method of thin film, comprises the following steps:
[0022] S01. Provide indium salt and MoO 3 , the indium salt and MoO 3 Dissolving in an organic solvent to form a mixed solution, adding an inorganic acid to the mixed solution and then performing heat treatment to obtain a precursor solution, wherein the temperature of the heat treatment is 50-80°C;
[0023] S02. Provide a substrate, deposit the precursor solution on the substrate by a solution processing method, and then perf...
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