Trench gate insulated gate bipolar transistor (IGBT) device and manufacturing method thereof
A trench gate and device technology, applied in the field of implant enhanced trench gate insulated gate bipolar transistor and insulated gate bipolar transistor, achieves good forward conduction voltage drop, good switching loss, and improved carrier concentration distribution Effect
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Embodiment 1
[0042] The trench gate IGBT of this example has a cell structure such as figure 2 As shown, it includes: a back collector metal 12, a P-type collector region 11 located on and connected to the back collector metal 12, an N-type field stop layer 10 located on and connected to the P-type collector region 11, The N-drift region 9 located on the N-type field stop layer 10 and connected to it; the composite trench structure located in the middle of the upper part of the N-drift region 9 and connected to it; The p-type body region 7, the sidewalls of the p-type body region 7 are connected to the sidewalls of the composite trench structure; the independent N+ emitter region 5 and the P+ emitter region 6 located on the upper part of the p-type body region 7 and connected thereto, The sidewalls of the N+ emitter region are connected to the sidewalls of the composite trench structure; the emitter metal 1 on the upper surface of the N+ emitter region and the P+ emitter region; characteriz...
Embodiment 2
[0044] The trench gate IGBT of this example has a cell structure such as image 3 As shown, on the basis of Embodiment 1, the width of the lower structure of the composite trench structure is greater than the width of the upper structure and extends into the N-type charge storage layer 8; the width of the p-type base region 7 formed is less than In the case of 1 micrometer, the width of the lower structure of the composite trench structure formed is 0.2-0.8 micrometers greater than the width of the upper structure. The underlying structure extending into the N-type charge storage layer 8 further reduces the extraction area of minority carriers, further improves the carrier injection enhancement effect at the emitter end, and can obtain a better device forward voltage drop It is a compromise between switching loss and the N-type charge storage layer's adverse effects on the breakdown voltage of the device, and higher breakdown voltage and reliability of the device are obtained....
Embodiment 3
[0046] The trench gate IGBT of this example has a cell structure such as Figure 4 As shown, on the basis of Example 2, there is also an N+ layer 14 in a part of the region between the lower structure of the composite trench structure and the p-type base region 7, and the concentration of the N+ layer 14 is greater than that of the N-type charge. The concentration of the storage layer 8 and its sidewalls are connected with the composite trench structure; the width of the formed p-type base region 7 is less than 1 micron, and the width of the lower structure of the formed composite trench structure is greater than the width of the upper structure In the case of 0.2 to 0.8 microns, the width of the formed N+ layer 14 is 0.2 to 0.8 microns. The formed N+ layer 14 further reduces the resistance of the region between the lower structure of the composite trench structure and the p-type body region 7, further improves the carrier injection enhancement effect of the emitter terminal, an...
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