Preparation method for curing fingerprint-resistant urethane acrylate with electron beam

A urethane acrylate and electron beam curing technology is applied in the preparation of fingerprint-resistant urethane acrylate, and the preparation field of electron beam curing fingerprint-resistant urethane acrylate can solve cracks, poor adhesion of inorganic silicon films, large expansion coefficient, etc. problem, to achieve the effect of excellent fingerprint resistance

Inactive Publication Date: 2016-07-20
浙江海嘉新材料有限公司
View PDF8 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the inorganic silicon film has poor adhesion, large expansion coefficient, and is easy to fall off and crack

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method for curing fingerprint-resistant urethane acrylate with electron beam

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] First, under the protection of nitrogen, add 1.0 molar parts of 1-methyl-1H-imidazole-5-carboxylic acid and 1.0 molar parts of 2,2,3,3,4,4,5, 5,6,6,7,7,7-pentadecafluoro-1-nonanol and 0.12 molar parts of carbodiimide and 0.20 molar parts of 4-dimethylaminopyridine and 150 ml of dichloromethane, mechanically stirred at 25°C For 1 hour, the raw materials were fully mixed, and the temperature was kept at 25°C for 48 hours with mechanical stirring, the reaction was stopped, 450 ml of distilled water was added to the reaction kettle, the mechanical stirring was stopped for 1 hour, the mechanical stirring was stopped, and the liquid was separated for 2 hours. Chloromethane phase, dichloromethane was distilled off under reduced pressure to obtain 1-methyl-1H-5-acid-2,2,3,3,4,4,5,5,6,6,7,7,7- Pentafluoro-1-nonyl ester.

[0018] Then, in another dry reactor, add 1.0 mole parts of 1-methyl-1H-5-acid-2,2,3,3,4,4,5,5,6,6,7,7, 7-Pentadecafluoro-1-nonyl ester and 1.1 molar parts of...

Embodiment 2

[0022] First, under the protection of nitrogen, add 1.0 molar parts of 1-methyl-1H-imidazole-5-carboxylic acid and 1.0 molar parts of 2,2,3,3,4,4,5, 5,6,6,7,7,7-pentadecafluoro-1-nonanol and 0.12 molar parts of carbodiimide and 0.20 molar parts of 4-dimethylaminopyridine and 150 ml of dichloromethane, mechanically stirred at 25°C For 1 hour, the raw materials were fully mixed, and the temperature was kept at 25°C for 48 hours with mechanical stirring, the reaction was stopped, 450 ml of distilled water was added to the reaction kettle, the mechanical stirring was stopped for 1 hour, the mechanical stirring was stopped, and the liquid was separated for 2 hours. Chloromethane phase, dichloromethane was distilled off under reduced pressure to obtain 1-methyl-1H-5-acid-2,2,3,3,4,4,5,5,6,6,7,7,7- Pentafluoro-1-nonyl ester.

[0023] Then, in another dry reactor, add 1.0 mole parts of 1-methyl-1H-5-acid-2,2,3,3,4,4,5,5,6,6,7,7, 7-pentadecafluoro-1-nonyl ester and 1.1 molar parts of...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a preparation method for curing fingerprint-resistant urethane acrylate with an electron beam. The preparation method includes: (1) preparing fluorine-containing micromolecular chain extender by esterification reaction and nucleophilic addition reaction; (2) by reaction between the fluorine-containing micromolecular chain extender and isocyanate, preparing polyurethane prepolymer, the end group of which is-NCO; (3) using pentaerythritol triacrylate to block the polyurethane prepolymer, so that the fingerprint-resistant urethane acrylate product is obtained. The fingerprint-resistant urethane acrylate prepared by the invention can be cured by the electron beam, and a cured film which is formed after curing has excellent fingerprint resistance, and can be applied to anti-fingerprint treatment of display panels of touch screens.

Description

technical field [0001] The invention relates to a preparation method of fingerprint-resistant polyurethane acrylate, in particular to a preparation method of electron beam curing fingerprint-resistant polyurethane acrylate, which belongs to the technical field of polymer materials. Background technique [0002] In recent years, touch-screen display panels have been more and more widely used in people's lives, such as touch-screen mobile phones, touch-screen computers, touch-screen vending machines, and the like. The touch screen display panel has the disadvantage of being easily attached to pollutants such as fingerprints, sweat stains, and dust during use, and these pollutants are not easy to erase, which seriously affects the service life and visual effect. [0003] In order to inhibit the adhesion of pollutants such as fingerprints, sweat stains, and dust on the surface of the touch screen display panel, the current common method is to coat a layer of inorganic silicon fi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C08G18/67C08G18/32C09D175/16C09D5/16
CPCC08G18/3848C08G18/673C09D5/1662C09D175/16
Inventor 徐海涛汪超
Owner 浙江海嘉新材料有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap