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Exhaust gas treatment device

A treatment device and exhaust gas technology, applied in the direction of combustion method, combustion type, incinerator, etc., can solve the problems of difficult and harmless, and achieve the effect of reliable high temperature, reliable combustion, and improved cooling efficiency

Active Publication Date: 2018-02-13
KOIKE SANSO KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In this case, there is a concern that it may be difficult to sufficiently detoxify

Method used

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Embodiment Construction

[0034] Hereinafter, the processing apparatus of the present invention will be described. The processing device of the present invention is used to process silane, disilane, diborane, phosphine, arsenic trihydride, nitrogen trifluoride, silicon fluoride, silicon chloride, etc. Toxic special material gases such as carbon tetrafluoride and sulfur hexafluoride, or freon gases such as carbon tetrafluoride and sulfur hexafluoride, which have a negative impact on the global environment, and explosive hydrogen gas are burned or decomposed to be harmless and discharged.

[0035] The treatment device of the present invention is configured to supply the exhaust gas to be detoxified and the combustion-supporting gas into the combustion chamber, and to keep the combustion chamber at a high temperature by igniting the burner, so that the supplied exhaust gas can be combusted without harm. Harmful, or decomposed at high temperature without harm. Furthermore, the treatment apparatus of the p...

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Abstract

[Problem] To provide exhaust gas treatment equipment for removing an exhaust gas by burning or pyrolyzing the same in a rational manner. [Solution] Treatment equipment (A) having: a combustion chamber (1) for removing a supplied exhaust gas by burning or decomposing the same, one end part (1a) of the combustion chamber (1) being closed; an exhaust pipe (2) for discharging the removed exhaust gas and connected to an other end part (1b) of the combustion chamber (1); and a housing (10) for accommodating the combustion chamber (1) and the exhaust pipe (2). In the combustion chamber, an exhaust gas supply port (3) for supplying the exhaust gas to be removed to the closed one end part (1a) side is provided, a burner (4) is provided closer to the exhaust pipe (2) side than is the exhaust gas supply port (3), and a combustion-sustaining gas supply nozzle (5) for supplying a combustion-sustaining gas is provided between the burner (4) and the exhaust gas supply port (3), or is provided closer to the exhaust pipe (2) side than is the burner (4).

Description

technical field [0001] The present invention relates to an exhaust gas treatment device for detoxifying and discharging exhaust gas discharged from, for example, a semiconductor manufacturing process by burning or thermally decomposing it. Background technique [0002] For example, it is known that a specific process in the semiconductor manufacturing process generates a gas that is toxic to the human body or that has a negative impact on the global environment. When releasing such harmful gas into the atmosphere, removal and detoxification of toxic substances are required. Therefore, there have been proposed exhaust gas treatment devices capable of satisfying the above-mentioned requirements by detoxifying such exhaust gas by burning or decomposing it (for example, refer to Patent Documents 1 and 2). [0003] The exhaust gas processing device described in Patent Document 1 has: a cylindrical combustion chamber, one end of which is blocked, and introduced into the exhaust g...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F23G7/06F23J1/06
CPCF23G5/32F23G7/065F23J1/06
Inventor 金丙哲藤森一彰森山优星野铁郎藤木亮马育新小池哲夫
Owner KOIKE SANSO KOGYO CO LTD
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