Carbon nano-material film saturation absorber and preparation method thereof

A technology of carbon nanomaterials and material thin films, which is applied in the field of preparation of ultrashort pulse laser saturable absorbers, can solve the problems of limiting pulse laser output power, achieve high output power, short recovery time, and prevent high temperature oxidation reactions.

Inactive Publication Date: 2015-12-30
THE HONG KONG POLYTECHNIC UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a method for preparing a saturated absorber of a carbon nanomaterial film, which solves the problem of long-term irradiation of a high...

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  • Carbon nano-material film saturation absorber and preparation method thereof
  • Carbon nano-material film saturation absorber and preparation method thereof
  • Carbon nano-material film saturation absorber and preparation method thereof

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preparation example Construction

[0085] The invention also provides a method for preparing a carbon nanomaterial film saturated absorber, figure 2 Show the flow chart of the preferred embodiment of the preparation method of carbon nanomaterial thin film saturated absorber of the present invention, as figure 2 Shown, described preparation method comprises the steps:

[0086] S1. Treating the substrate: a circular transparent material is used as the substrate, and the surface of the substrate is treated with oxygen plasma to obtain a hydrophilic substrate. The diameter of the circle is 10mm-100mm, and the height of the circle is 0.5mm-2mm. The transparent material is selected from one of the following materials: quartz, glass, sapphire, silicon carbide crystal, gallium nitride crystal. Surface treatment with oxygen plasma in advance can improve the hydrophilicity of the substrate. The surface treatment process can only treat a circular surface of the film substrate, or the substrate can be treated as a whol...

Embodiment 1

[0092] Ultrasonically disperse the carbon nanotubes in absolute ethanol to form a suspension with a concentration of 0.5mg / ml, use a circular quartz plate with a diameter of 30mm and a thickness of 1mm as the substrate, clean it ultrasonically with acetone, dry it, and then use Oxygen plasma was treated for 60 minutes to improve the hydrophilicity of the surface, and the above-mentioned carbon nanotube suspension was used as a coating solution to prepare a carbon nanotube film by dipping and pulling coating method. The ambient temperature and humidity were 18°C ​​and 40%, respectively. The pulling speed is 96nm / s. Then the prepared film was vacuum dried at 80°C. Finally, the film-coated substrate is installed on the rotating shaft and connected to the driver, which completes the production of the rotation-protecting saturated absorber.

Embodiment 2

[0094] Graphene oxide is ultrasonically dispersed in ethanol to form a suspension with a concentration of 1 mg / ml. A quartz plate with a diameter of 30 mm and a thickness of 0.5 mm is used as a substrate, cleaned ultrasonically with acetone, dried, and then treated with oxygen plasma 60min, improve the hydrophilicity of its surface, use the above-mentioned graphene oxide suspension as the coating solution, and prepare a carbon nanotube film by the spin coating method, and the spin speed is 3000rpm. Then the prepared film was vacuum dried at 80°C. Finally, the film-coated substrate is installed on the rotating shaft and connected to the driver, which completes the production of the rotation-protecting saturated absorber.

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Abstract

The invention relates to a carbon nano-material film saturation absorber and a preparation method thereof. The saturation absorber comprises a circular base material (10) made of a transparent material, a carbon nano-material film (20) attached to at least one circular surface of the circular base material (10), and a driver (30) driving the circular base material (10) to rotate along the axis direction thereof. According to the invention, the rotation-type saturation absorber structure is adopted, the interaction between high-energy lasers and a sample is not concentrated at one point, and heat is not accumulated, so that the high-temperature oxidation reaction of the carbon material is effectively prevented, the light injury threshold of the saturation absorber is further improved, and pulse lasers higher in output power can be obtained; in addition, the saturation intensity is low, the recovery time is short, and the response wavelength range is wide.

Description

technical field [0001] The invention belongs to the technical field of preparation of ultrashort pulse laser saturable absorbers, and more specifically relates to a carbon nanomaterial film saturable absorber and a preparation method thereof. Background technique [0002] Ultrashort pulse laser has a wide range of applications, such as ultrafast optical switch, optical fiber communication, optical fiber sensor, industrial processing, laser guidance, laser medical treatment and other fields. At present, the common method for generating ultrashort pulse laser is passive mode locking. This method system The structure is simple, and it can generate picosecond or even femtosecond ultrashort pulse laser. The basic mechanism is to add a saturable absorber in the optical path. After the light source passes through the saturable absorber, the loss of the wing part is greater than that of the central part, resulting in the narrowing of the light pulse, thereby generating ultrashort pu...

Claims

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Application Information

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IPC IPC(8): H01S3/11
Inventor 曾远康陶丽丽邓俊贤龙慧萧振声谢毅柱
Owner THE HONG KONG POLYTECHNIC UNIV
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