Light-emitting device with compactly arranged quantum dot light-emitting layer and preparation method of light-emitting device
A quantum dot light-emitting and light-emitting device technology, which is applied in the manufacture of semiconductor/solid-state devices, electric solid-state devices, semiconductor devices, etc., can solve the problems of low device efficiency, leakage current, and insufficient density of quantum dots, and solve the problem of efficiency decline , uniform and dense arrangement, and the effect of improving efficiency
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Embodiment 1
[0048] 1) The ITO conductive glass substrate is cleaned with chloroform, acetone and isopropanol in sequence, and then the cleaned ITO conductive glass substrate is treated with ultraviolet ozone plasma.
[0049]2), hole injection layer: MoO 3 (10nm) in high vacuum (1×10 -6 MPa) by thermal evaporation (MoO 3 powder).
[0050] 3), hole transport layer: CuInS 2 Quantum dots were spin-coated in cyclohexane solvent (10 mg / mL) on MoO 3 on, and spin coating at approximately 2000 rpm for 30 seconds. Next, a 20 mM methanol solution of 1,8-octanediamine was heated to 60° C., and then the quantum dot film was immersed in the cross-linking solution and washed with pure methanol solution for 5 min. Then rinsed with isopropanol and dried under nitrogen flow, and then the film was annealed at 180 °C for 30 min in a nitrogen glove box.
[0051] 4), electron injection layer: TiO 2 (40 nm), the titania sol-gel precursor was diluted to 5 wt% in butanol and spin-coated at approximately 20...
Embodiment 2
[0055] 1) The ITO conductive glass substrate is cleaned with chloroform, acetone and isopropanol in sequence, and then the cleaned ITO conductive glass substrate is treated with ultraviolet ozone plasma.
[0056] 2), hole injection layer / hole transport layer: the aqueous solution of PEDOT:PSS used for the hole injection layer is spin-coated on the ITO, and the spin coating is carried out at a speed of about 4000rpm for 60 seconds, and then baked at 140°C Bake for 10 minutes.
[0057] The Poly-TPD used for the spin coating of the hole transport layer was dissolved and diluted to 8mg / mL in chlorobenzene, and the spin coating was carried out at a speed of about 2000rpm for 45 seconds, and then baked at 110°C for 20 minutes.
[0058] 3) Quantum dot light-emitting layer: hydrolyze 3-(methacryloyloxy)propyltrimethoxysilane on the surface of CdTe / CdS quantum dots to prepare SiO with methacryloyl groups at the end 2 Shell stabilized CdTe / CdS / SiO 2 Core-shell quantum dots were config...
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