Cerium oxide polishing solution and preparation method thereof

Abstract

The invention discloses a cerium oxide polishing solution which comprises the following main components: 0.1-0.3 part of xanthan gum, 0.5-3 parts of sodium tripolyphosphate, 3-7 parts of sodium xylenesulfonate, 0.1-0.3 part of EDTA-2Na, 3-7 parts of glycerol, 2-5 parts of polyethylene glycol 400, 1-3 parts of aluminum magnesium silicate, 0.1-0.5 part of thiocarbamide, 1-5 parts of triethanolamine, 50-60 parts of cerium oxide polishing powder and 20-35 parts of water. The cerium oxide polishing solution has the advantages of high polishing speed, high polishing precision, fewer scratches and favorable suspension property. The polishing solution has favorable chemical and physical properties, is widely used in industrial product polishing, and can be used for polishing various optical glass devices, television kinescopes, optical spectacle lenses, oscilloscopes, plate glass, semiconductor chips, metal precision products and the like.

Description

technical field [0001] The invention relates to a rare earth polishing liquid, which belongs to the field of grinding and polishing. technical background [0002] With the development of the rare earth industry, rare earth polishing powders soon succeeded in polishing precision optical instruments. Due to the advantages of high polishing efficiency, good quality, and low pollution, rare earth polishing powder has rapidly developed into the most popular precision polishing material on the market. In particular, cerium oxide polishing powder is the most superior. Due to the excellent chemical and physical properties of cerium-based rare earth polishing powder, it has been widely used in the polishing of industrial products, such as various optical glass devices, TV picture tubes, and optical glasses. Polishing of wafers, oscilloscope tubes, flat glass, semiconductor wafers and metal precision products. In order to endow the polishing powder with superior performance, the dis...

AI Technical Summary

Problems solved by technology

[0003] At present, most of the commercially available polishing liquids use titanium oxide, iron oxide, and silicon dioxide as abrasives, supplemented by other dispersing aids to obtain polishing liquids. This type of polishing liquid has low polishing precision and slow grinding speed, which is far from satisfying the existing production technology. need

There are also a few manufacturers who use rare earth cerium oxide as abrasive to make polishing fluid, but due to poor dispersion and suspension performance, ions are easy to agglomerate, resulting in scratches on the workpiece. The surface of the workpiece and the machine will cause the abrasive to sink to the bottom and agglomerate, reducing the efficiency of grinding and polishing

After polishing, there is a lot of polishing powder remaining on the surface of the workpiece, which is difficult to clean and brings difficulties to the normal production in the later stage

It has failed to achieve standardization and serialization, and cannot fully meet the polishing requirements of various industrial fields

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