Preparation method of perovskite solar cell light absorption layer material methylamine lead dibromide
A technology of methylamine lead bromide and solar cells, which is applied in the manufacture of circuits, electrical components, and final products, can solve the problem that it is difficult to obtain perovskite absorbing layers, and that perovskite cells cannot be commercially produced on a large scale. Problems such as high cost price, achieve the effects of shortening the holding time, good stability and light absorption performance, and simple system operation
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Embodiment 1
[0025] (1) Clean the substrate
[0026] Use FTO conductive glass with a thickness of 3mm as the substrate, first ultrasonically clean it in acetone for 10 minutes, then clean it in absolute ethanol for 10 minutes, finally rinse it with deionized water, and dry it;
[0027] (2) Preparation of reaction solution
[0028] Get 0.01mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.02mol solid lead bromide (PbBr 2 ), add 20mL of N,N-dimethylformamide (DMF) solution, and stir until the solid powder is completely dissolved to obtain a reaction solution;
[0029] (3) Pulse electromagnetic field treatment
[0030] Pour the reaction solution prepared in step (2) into a beaker, and apply a pulse voltage of 500v to the reaction solution, and a pulse electromagnetic field treatment with an electric pulse frequency of 3Hz for 3min;
[0031] (4) Spin coating film formation
[0032] Add the pulse-treated reaction solution dropwise on the conductive glass substrate, and perform low...
Embodiment 2
[0036] (1) Clean the substrate
[0037] Use FTO conductive glass with a thickness of 4mm as the substrate, first ultrasonically clean it in acetone for 15 minutes, then clean it in absolute ethanol for 15 minutes, and finally rinse it with deionized water and dry it;
[0038] (2) Preparation of reaction solution
[0039] Get 0.01mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.01mol of solid lead bromide (PbBr 2 ), add 15mL of N,N-dimethylformamide (DMF) solution, and stir until the solid powder is completely dissolved to obtain a reaction solution;
[0040] (3) Pulse electromagnetic field treatment
[0041] Pour the reaction solution prepared in step (2) into a beaker, and apply a pulse voltage of 600v to the reaction solution, and a pulse electromagnetic field with an electric pulse frequency of 4Hz for 150s;
[0042] (4) Spin coating film formation
[0043] Add the pulse-treated reaction solution dropwise on the conductive glass substrate, and perform low-spe...
Embodiment 3
[0047] (1) Clean the substrate
[0048] Use FTO conductive glass with a thickness of 5mm as the substrate, first ultrasonically clean it in acetone for 20 minutes, then clean it in absolute ethanol for 20 minutes, and finally rinse it with deionized water and dry it;
[0049] (2) Preparation of reaction solution
[0050] Get 0.02mol of solid methyl ammonium bromide (CH 3 NH 3 Br) and 0.01mol of solid lead bromide (PbBr 2 ), add 20mL of N,N-dimethylformamide (DMF) solution, and stir until the solid powder is completely dissolved to obtain a reaction solution;
[0051] (3) Pulse electromagnetic field treatment
[0052] Pour the reaction solution prepared in step (2) into a beaker, and apply a pulse voltage of 700v to the reaction solution, and a pulse electromagnetic field treatment with an electric pulse frequency of 5Hz for 2min;
[0053] (4) Spin coating film formation
[0054] Add the pulse-treated reaction solution dropwise on the conductive glass substrate, and perfo...
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