Surface texturing method of solar battery and of great-wall solar battery substrate

Abstract

A solar battery surface texturing processing method comprises the following steps: a, providing a silicon wafer (1) and an etching agent (2); b, placing the silicon wafer in a reaction chamber in which the etching agent is placed or above the etching agent to perform chemical vapor etching, or immersing the silicon wafer in the etching agent to perform liquid phase etching; and c, repeating step b at least once. In this texturing processing method, better heterogeneity can be formed, and therefore a good porous layer can be obtained for a silicon wafer in another crystal orientation, thereby obtaining a lower luminous reflectance.

Description

technical field [0001] The invention relates to the field of preparation of crystalline silicon solar cells, in particular to a method for surface texturing of solar cells and a method for surface texturing of Great Wall solar cell substrates. Background technique [0002] As an efficient green and sustainable energy source, solar cells have been widely researched and utilized. However, since the manufacturing cost of solar cells is too high to replace traditional energy sources, cost reduction has become the biggest problem in the application of solar cells. The cost of solar cells is closely related to the efficiency of the cells, so how to improve the conversion efficiency of the cells is the key to the further development of the solar cell industry. The refractive index of traditional silicon wafers is very high, and its reflection loss can generally reach more than 40%. In the previous solar cell manufacturing process, it was proposed to make the silicon wafer with a t...

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Problems solved by technology

However, neither of the two etchants can achieve a good etching effect on single crystal silicon with other crystal orientations.

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