Rare earth polishing liquid and preparation method thereof

Abstract

The invention provides a rare earth polishing liquid and a preparation method thereof; the rare earth polishing liquid comprises the following components in parts by weight: 20-50 parts of a rare earth polishing powder, 3-15 parts of an organic solvent, 1-5 parts of clay, and 30-76 parts of water. The rare earth polishing liquid solves the problem of suspension dispersion of a polishing powder in water, overcomes the bonding problem of the polishing liquid in preparation and storage processes and good cleaning problem of the polishing liquid in a use process at present, and has the characteristics of good suspension dispersibility, fast polishing speed, high polishing precision, excellent cleaning performance of polished products and the like. The rare earth polishing liquid is suitable for surface polishing processing of integrated circuits, flat panel display, optical glass and other electronic information industry precision devices, and meets polishing yield rate requirements of increasingly-strict business on polishing materials in accuracy, polishing corrosion amount, easy cleaning and the like.

Description

technical field [0001] The invention relates to a rare earth polishing liquid and a preparation method thereof, in particular to a cerium-based mixed rare earth polishing liquid suitable for surface polishing of precision devices in the electronic information industry such as integrated circuits, flat displays and optical glasses, and a preparation method thereof. Background technique [0002] At present, various glass materials are widely used, and these materials need to undergo necessary surface polishing before being applied. In the early days, materials such as zirconia, iron oxide or silicon dioxide were mainly used to polish various glass surfaces. In recent years, considering the polishing efficiency and precision, polishing materials with rare earth oxides (especially cerium oxide) as the main component have been used. It is considered more suitable for surface polishing of glass materials. [0003] With the rapid development of electronic information technology, t...

AI Technical Summary

Problems solved by technology

However, in fact, the smaller the particles of cerium-based abrasives, the lower the dispersibility, and the aggregation is easy to occur.

Even if the particle size is small, the dispersion maintenance cannot be improved, so just mixing in the dispersion medium and stirring, still cannot maintain sufficient dispersion maintenance

[0014] Although the current polishing liquid avoids the environmental protection of powder products, it is easy to form hard precipitates due to the long-term standing of the slurry, and it takes time to resuspend.

[0015] On the other hand, because during the polishing process, the polishing liquid remains on the surface of the glass, etc., due to the rapid volatilization of water, the abrasive particles remain on the surface of the glass, which increases the difficulty of cleaning and leads to a low cleaning yield.

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