Large-area uniform raman detection chip for porous membrane sensitivity enhancing and preparation method for large-area uniform raman detection chip
A detection chip and porous film technology, applied in the field of optical detection, can solve the problems of complex SERS chip process, high cost, fingerprint Raman signal interference, etc. Effect
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no. 1 example
[0035] In the first exemplary embodiment of the present invention, a large-area uniform Raman detection chip sensitized by a porous membrane is proposed. Figure 1A It is a schematic cross-sectional view of a large-area uniform Raman detection chip sensitized by a porous membrane according to the first embodiment of the present invention. like Figure 1AAs shown, the large-area uniform Raman detection chip sensitized by the porous membrane comprises: a substrate 1; a transition film 10 formed on the upper surface of the substrate 1; a gold film 11 formed on the upper surface of the transition film 10; The reinforced structure film 2 is formed on the outer surface of the gold film 11, which is used as the electromagnetic enhancement layer of the Raman detection chip in this embodiment; the nanoporous film 3 is formed on the outer surface of the gold-based reinforced structure film 2 to enrich the To measure molecules, increase the number of molecules to be measured within the ra...
no. 3 example
[0057] In the third exemplary embodiment of the present invention, a method for preparing the porous membrane-sensitized large-area uniform Raman detection chip described in the second embodiment is also provided. figure 2 It is a flowchart of a method for preparing a large-area uniform Raman detection chip sensitized by a porous membrane according to the third embodiment of the present invention.
[0058] Please refer to Figure 1 and figure 2 , the preparation method comprises:
[0059] Step S202: preparing a transition film 10 on the substrate 1;
[0060] Wherein, the substrate can be selected from one of flat glass, silicon wafer, ceramic wafer and metal wafer. Before preparing the transition film, the substrate needs to be cleaned. The cleaning process can be done according to the standard procedure.
[0061] The transition film is prepared by vacuum deposition technique on the upper surface of the cleaned substrate. The material of the transition film is chromium, ...
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