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Method for manufacturing soluble fixed soft abrasive-polishing film

A production method and soluble technology, applied in the direction of grinding/polishing equipment, polishing composition containing abrasives, abrasives, etc., can solve difficult small-diameter parts or non-planar parts processing, resin bond is easy to adhere to the polishing surface, Unable to meet the high-quality mass production of advanced ceramic material components, etc., to achieve the effect of reducing the content of resin binder, durable polishing performance, and high-efficiency polishing

Inactive Publication Date: 2014-12-17
QUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the general fixed abrasive polishing mainly uses a flat polishing pad with uniform protrusions, and there are grooves between the fixed abrasive grain protrusions, which is difficult to process small-diameter parts or non-planar parts
Existing film polishing abrasives have problems such as resin bond is easy to stick to the polishing surface, which cannot meet the needs of high-quality mass production of advanced ceramic material components

Method used

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  • Method for manufacturing soluble fixed soft abrasive-polishing film

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Embodiment 1

[0013] A method for making a soluble fixed soft abrasive polishing film, the structure of which is as follows figure 1 shown. Soft abrasive layer 1 adopts the following method to make: to make 100 grams of soft abrasive layer, take the composition quality of abrasive layer, as follows by mass percentage: binder (polyvinyl alcohol) quality is 10~25%, soft abrasive 50% to 60%, 1% to 5% furfural, 1% to 5% paraffin wax emulsion, 3% to 10% salt, 0.5% to 1% abrasive modified dispersant, and the sum of the mass percentages of each component is 100%. The soft abrasive is silicon oxide, and the particle size specifications are 300nm, 100nm, and 40nm. The mass ratio is 5:2:3.

[0014] Production process: first put deionized water into the reaction pot, add polyvinyl alcohol under stirring, heat to a constant temperature of 85-95 degrees Celsius, so that all polyvinyl alcohol is dissolved in water; add 10 grams of hydrochloric acid with a concentration of 20-30%, Stir for 10-20 minut...

Embodiment 2

[0018] A method for making a soluble fixed soft abrasive polishing film, the structure of which is as follows figure 1 shown. Soft abrasive material layer 1 adopts following method: to make 100 grams of soft abrasive material layer, weigh abrasive material layer composition and calculate as follows by mass percentage: bonding agent (alkyd resin) quality 12~20%, soft abrasive material quality are 40~60% %, the mass of furfural is 1-3%, the mass of paraffin wax emulsion is 1-5%, the mass of table salt is 3-8%, and the mass of abrasive modified dispersant is 0.5-1%. The abrasive is cerium oxide, and the particle size specifications are 50 μm, 15 μm, and 5 μm. The mass ratio is 6:2:2.

[0019] Production process: first put deionized water into the reaction pot, add alkyd resin under stirring, heat to a constant temperature of 85-95 degrees Celsius, so that the alkyd resin is completely dissolved in water; add 10 grams of hydrochloric acid with a concentration of 20-30%, Stir fo...

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Abstract

The invention relates to a soluble fixed soft abrasive-polishing film, which comprises an abrasive layer and a substrate layer and has the thickness of 0.3 to 5mm. A soluble high-molecular material is used as a bonding agent of the abrasive layer, and a certain proportion of multilayer particle-diameter soft microfine abrasives are distributed and coated on the elastic substrate according to a certain rule. Small-particle-diameter abrasive particles not only can directly participate in a polishing process, but also can be used as a filling material and achieves the effect of supporting large particles, so that the content of a resin bonding agent in the polishing film is decreased, and the problems of film surface cracking and breakage are effectively solved. A specific nonpoisonous and harmless aqueous solvent is adopted in the machining process to solve the bonding agent on the surface layer of the polishing film, so that the holding force of he bonding agent for the abrasive particles is decreased to enable the bonding agent to fall off; on one hand, the passivated abrasive particles on the surface layer can be removed, so that the polishing film has more lasting polishing performance; on the other hand, the abrasive particles which are fixed on the surface of the polishing film and the abrasive particles which fall off and are dispersed into a polishing solution jointly act on a workpiece, so that the ultra-smooth high-efficiency surface polishing of the workpiece can be realized.

Description

technical field [0001] The invention relates to the field of grinding / polishing, in particular to a method for preparing a soluble fixed soft abrasive polishing film. Background technique [0002] With the continuous improvement of product performance, the modern optoelectronic information field has higher and higher requirements for the processing accuracy and surface quality of materials. Polishing technology has always been the most important method of ultra-precision machining. It is the final processing means to reduce surface roughness, remove damaged layers, and obtain smooth and damage-free surfaces. At present, the traditional free abrasive polishing used in the field of advanced ceramic processing has problems such as low processing efficiency, serious waste of abrasive grains, high cost of polishing liquid treatment, and serious environmental pollution. How to solve the above problems and realize high-quality, high-efficiency, and green production of advanced cera...

Claims

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Application Information

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IPC IPC(8): B24D11/00C09G1/02B24D18/00
Inventor 周兆忠冯凯萍邓乾发吕冰海袁巨龙
Owner QUZHOU UNIV
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