Photosensitive Resin Composition And Spacer Preprared From The Same

A technology of photosensitive resin and composition, applied in the direction of photosensitive materials, optics, and optomechanical equipment used in optomechanical equipment, can solve the problem of wide size, etc., and achieve excellent adhesion, excellent T/B ratio, transparency high effect

Inactive Publication Date: 2014-09-10
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the light passing through the mask diffuses to the above-mentioned space, there is a problem that exposure is wider than the designed size of the mask pattern.

Method used

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  • Photosensitive Resin Composition And Spacer Preprared From The Same
  • Photosensitive Resin Composition And Spacer Preprared From The Same
  • Photosensitive Resin Composition And Spacer Preprared From The Same

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example

[0185] [Synthesis example: Alkali-soluble resin (A-1)]

[0186] In a 1L flask equipped with a reflux condenser, a dropping funnel, and a stirrer, nitrogen was introduced at a flow rate of 0.02 L / min, and 200 parts by mass of 3-methoxy-1-butanol and 105 parts by mass of 3 -Methoxybutyl acetate, heated to 70°C with stirring. Then, it was dissolved in 240 parts by mass of a mixture of the following chemical formula 28 and chemical formula 29 (molar ratio 50:50), 60 parts by mass of methacrylic acid and 140 parts by mass of 3-methoxybutyl acetate to prepare solution.

[0187] 【Chemistry 17】

[0188]

[0189] 【Chemistry 18】

[0190]

[0191] Using a dropping funnel, the prepared solution was dropped into a flask kept at 70° C. over 4 hours. On the other hand, 30 parts by mass of a polymerization initiator 2,2'-azobis(2,4-dimethylvaleronitrile) was dissolved in 225 parts by mass of 3-methoxybutyl acetate to prepare a solution , using another dropping funnel to drop the so...

Embodiment 1～5 and comparative example 1～3

[0205] According to the component and composition described in following Table 1, the photosensitive resin composition (unit is weight part) was prepared. 【Table 1】

[0206]

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Abstract

The present invention relates to a photosensitive resin composition and a spacer prepared from the same. In specific, the photosensitive resin composition includes an alkali-soluble resin, a photocurable monomer, a photopolymerization initiator, an amino acetophenone-based or amino benzaldehyde acetophenone-based hydrogen donor, and a solvent, thereby improving photoreactivity by activating alkyl radicals generated from the photopolymerization initiator and providing improved sensitivity by maximizing light efficiency. Accordingly, the sensitivity of the photosensitive resin composition is largely improved.

Description

technical field [0001] The present invention relates to a photosensitive resin composition and a spacer manufactured using the composition, more specifically, to a photosensitive resin composition having high sensitivity and high crosslink density and a spacer manufactured using the composition spacer. Background technique [0002] A general display device uses silicon beads or plastic beads having a constant diameter in order to maintain a constant distance between the upper and lower substrates. However, the above-mentioned beads are randomly dispersed on the substrate, and when they are located inside a pixel, there is a problem that an aperture ratio decreases and light leakage occurs. In order to solve such problems, spacers formed by photolithography are used inside the display device, and in recent years, the use of photolithography has become a common technique in the manufacture of spacers used in image display devices. [0003] The method of forming spacers by ph...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/027
CPCG02F1/133G03F7/004G03F7/0045G03F7/028G03F7/20
Inventor 赵庸桓井上胜治张元凡
Owner DONGWOO FINE CHEM CO LTD
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