A kind of cold and hot alternate chemical bath method prepares the method for cdse thin film

A thin film and chemical technology, applied in the field of preparation of CdSe thin film, can solve the problems of molecular beam epitaxy, such as complex process, adsorption on the surface of the substrate, and difficult control of crystal morphology, etc., and achieve the effect of shortening the preparation time

Active Publication Date: 2015-09-23
佛山市顺德区汇强包装彩印有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, although the electrodeposition method has relatively simple production equipment and low requirements for reaction conditions, it is not easy to control the shape of the crystal; the molecular beam epitaxy method is more complicated and is not conducive to large-scale production; and the hydrothermal method needs to be carried out in a sealed environment. , the shape of the product is not easy to control; most of the solvents used in the sol-gel method are organic solvents, which pollute the environment; the products generated by the chemical bath deposition method during the preparation process cannot be well adsorbed on the surface of the substrate
There is no report on the preparation of CdSe thin films by cold and hot alternate chemical bath deposition

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0011] (1) Add 20mL of Cd(NO 3 ) 2 Place in an ice-water bath as Cold Solution A.

[0012] (2) Add 10 mL of KBH with a concentration of 0.6 mol / L 4 With 10mL concentration of 0.06mol / L Na 2 SeO 3 Mixed and heated to 80°C, the solution reacted to reddish brown, and quickly became colorless within 6 seconds as hot solution B.

[0013] (3) Immerse the clean ITO conductive glass vertically into the cold solution A obtained in step (1) for 15 seconds, take it out, and quickly immerse it in the hot solution B obtained in step (2) for 15 seconds,

[0014] (4) Repeat step (3) 10 times, and a reddish-brown CdSe film appears on the surface of ITO.

Embodiment 2

[0016] (1) Add 20mL of Cd(NO 3 ) 2 Place in an ice-water bath as Cold Solution A.

[0017] (2) Add 10mL of KBH with a concentration of 0.42mol / L 4 With 10mL of Na with a concentration of 0.06mol / L 2 SeO 3 Mix and heat to 80°C, the solution reacts to reddish brown, and rapidly becomes colorless within 5 seconds as hot solution B.

[0018] (3) Immerse the clean ITO conductive glass vertically in the cold solution A obtained in step (1) for 60 seconds, take it out, and quickly immerse it in the hot solution B obtained in step (2).

[0019] (4) Repeat step (3) 4 times, and a red-brown CdSe film appears on the surface of ITO.

Embodiment 3

[0021] (1) Add 20mL of Cd(NO 3 ) 2 Place in an ice-water bath as Cold Solution A.

[0022] (2) Add 10 mL of KBH with a concentration of 0.54 mol / L 4 With 10mL of Na with a concentration of 0.06mol / L 2 SeO 3 Mix and heat to 70°C, the solution reacts to reddish brown, and rapidly turns colorless within 4 seconds as hot solution B.

[0023] (3) Immerse the clean ITO conductive glass vertically in the cold solution A obtained in step (1) for 30s, take it out, and quickly immerse it in the hot solution B obtained in step (2) for 30s.

[0024] (4) Repeat step (3) 15 times, and a red-brown CdSe film appears on the surface of ITO.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for preparing a CdSe film by adopting a cold-heat alternating chemical bath method. The method comprises the following steps of: (1) placing 20 mL of Cd(NO3) with the concentration of 0.03-0.10 mol / L into an ice-water bath as a cold solution A; (2) mixing 10 mL of KBH4 with the concentration of 0.42-0.6 mol / L and 10 mL of Na2SeO3 with the concentration of 0.06 mol / L, heating to 70-80 DEG C, reacting a solution to a red-brown color, and fast turning into an achromatic color within 4-8 seconds as a heat solution B; (3) vertically immersing a clean ITO (Indium Tin Oxid) conductive glass into the cold solution A obtained from the step (1), taking out after 5-60 seconds, fast immersing into the heat solution B obtained from the step (2), and also sustaining for 5-60 seconds; (4) repeating the step (3) for 4-20 times to generate the CdSe film in the red brown color on an ITO surface. The method disclosed by the invention is short in preparation time, can be used for controlling the thickness of the CdSe film by changing the cycle times of a cold-heat alternating chemical bath without using a toxic organic solvent and has the characteristic of firmly absorbing the CdSe film on ITO.

Description

technical field [0001] The invention relates to a method for preparing a CdSe thin film by a cold and hot alternate chemical bath method. Background technique [0002] Solar cells are mainly classified by materials into silicon solar cells, inorganic compound solar cells, dye-sensitized solar cells, etc. Silicon solar cells are constrained by the disadvantages of high pollution and high energy consumption in the preparation of silicon materials, so the preparation of low-pollution, low-energy The solar materials with good photoelectric performance and low power consumption are the focus of research by researchers from all over the world. Cadmium selenide (CdSe) is an n-type semiconductor material with a direct energy gap, belonging to the II-VI group semiconductor material, and its band gap is about 1.8eV. It is a semiconductor material with relatively stable chemical properties and has unique optical properties. The photoelectric conversion characteristics and obvious nonl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/34
Inventor 钟福新王丹宇黎燕王伟莫德清王苏宁朱义年
Owner 佛山市顺德区汇强包装彩印有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products