A method for growing trivalent cerium ion doped yttrium lutetium silicate scintillation crystal
A yttrium lutetium silicate and crystal technology, which is applied in the field of pulling Ce3+ doped yttrium lutetium silicate crystals, can solve the problems of low crystal yield, increased crystal cracking, long crystal growth time, etc., and is not easy to crack. and yellowing, good crystal quality, good crystal quality effect
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Embodiment 1
[0028] Example 1.Ce 3+ The growth of doped yttrium lutetium silicate crystals, the specific process is as follows figure 1 Shown:
[0029] (1) Weighing and mixing: according to trivalent Ce 3+ Chemical formula Ce of doped yttrium lutetium silicate single crystal 2x (Lu 1-y Y y ) 2(1-x) SiO 5 , wherein, 0.001≤x≤0.05, 02 O and CO 2 , by oxide (Lu 2 o 3 , Y 2 o 3 , CeO 2 , SiO 2 ) The corresponding molar ratio is accurately weighed, and fully mixed into a uniform powder;
[0030] (2) Pressing and sintering: Press the mixed powder into a cylindrical cake under a pressure of 150Mpa, and sinter at 1300°C for 15 hours to form Ce 3+ Doped yttrium lutetium silicate polycrystalline cake material, in which the cold isostatic pressing machine is used for pressing, and the muffle furnace is used for sintering;
[0031] (3) Heating and melting: Put a crucible that can withstand high temperature and will not deteriorate rapidly in an oxygen environment, such as an iridium cru...
Embodiment 2
[0038] Growth Ce described in Example 1 3+ The growth furnace used for doping yttrium lutetium silicate crystals is an improved crystal furnace. The improvement of the crystal furnace was previously submitted in the application titled "A Straightening White Gem Single Crystal Growth Furnace Structure Improvement and Method" (Application No. 201210099937. X) is improved on the basis of the main improvements in the following two aspects:
[0039] ① A gas outlet 8 is added to the heat insulator. The position of the gas outlet 8 on the heat insulator 1 is symmetrical to the left opening 4 of the gas inlet. It is mainly used for in-situ annealing after crystal growth. 2 and N 2 The mixed gas is discharged to H 2 and N 2 in the collection box;
[0040] ② On the middle opening 5 directly above the heat insulator, place a sealing cover 6 and two small doors 7 are arranged on both sides of the sealing cover, during the crystal growth process O 2 and N 2 The mixed gas flows out fr...
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