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Resource utilization method of high-concentration ammonia nitrogen waste liquid

A high-concentration, resource-based technology, applied in chemical instruments and methods, metallurgical wastewater treatment, water/sewage multi-stage treatment, etc., can solve problems affecting the quality of etching sub-liquid, avoid ammonia nitrogen re-pollution, and reduce treatment energy consumption , the effect of improving economic efficiency

Inactive Publication Date: 2014-05-28
惠州TCL环境科技有限公司
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Problems solved by technology

However, this process does not purify the filtrate, which contains SO 4 2- and a small amount of Cu 2+ Such impurities will seriously affect the quality of the etching sub-liquid; in addition, this patent can only be formulated into an alkaline etching sub-liquid

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  • Resource utilization method of high-concentration ammonia nitrogen waste liquid
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Embodiment Construction

[0022] The following describes the present invention in further detail in combination with specific embodiments, and is not intended to limit the protection scope of the present invention. The composition of the high-concentration ammonia nitrogen waste liquid after copper extraction from the copper-containing etching waste liquid in the circuit board industry is shown in Table 1.

[0023] Table 1 High-concentration ammonia nitrogen waste liquid composition table.

[0024]

[0025] Step 1: Remove impurities.

[0026] (1) 16 cubic meters of copper-containing wastewater collected are slowly added dropwise to a chelating resin column with a height of 1 meter and a volume of 12 cubic meters. The residence time of the waste liquid in the resin column is 1 minute, and it is collected after passing through the ion exchange column. Copper-free ammonia nitrogen wastewater, the copper content in copper-free wastewater is 0.8ppm after testing;

[0027] (2) Use 5% analytically pure hydrochloric ...

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Abstract

The invention discloses a resource utilization method of a high-concentration ammonia nitrogen waste liquid. The method comprises the steps as follows: 1, impurity removal: after copper in an etching liquid containing copper is recovered, an ion exchange technique is utilized to absorb and recover low-concentration copper ions in residual high-concentration ammonia nitrogen wastewater, and a regenerative copper chloride raw material is obtained after resin dissolving; and an appropriate amount of barium chloride is added in wastewater without copper so as to remove sulfate radical impurities introduced during a copper sulfate production process; and 2, blending: residual wastewater without copper is the high-concentration ammonia nitrogen wastewater, ammonium chloride concentration is adjusted with an addition method or through evaporation and concentration by a multi-effect evaporator, and then an auxiliary etching liquid is blended according to a corresponding formula and is reused for the circuit board industry. With the adoption of the method, not only is an environmental pollution problem caused by heavy metal ions and the high-concentration ammonia nitrogen waste liquid solved, but also the closed cyclic utilization of the etching liquid of the circuit board industry is achieved, the resource is saved, and the environment is protected.

Description

Technical field [0001] The invention relates to a resource utilization method of high-concentration ammonia nitrogen waste liquid, which is mainly aimed at comprehensive utilization of high-concentration ammonia nitrogen waste liquid after extracting copper from copper-containing etching waste liquid in the circuit board industry. The method particularly relates to a method for removing impurities from high ammonia nitrogen wastewater. The method particularly relates to a method for recovering high ammonia nitrogen wastewater containing low-concentration copper by ion exchange technology, to a method of using barium chloride to remove sulfate radicals to form barium sulfate, and to distillation and concentration of ammonia nitrogen wastewater The method involves a method in which the ammonia nitrogen wastewater concentrate is formulated into an alkaline etching sub-liquid and a single-liquid acid etching sub-liquid product according to a specific formula and reused in the circuit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F9/04C02F9/10C02F103/16C02F101/16
Inventor 沈雨锋王治军欧阳俊治王九飙李红玲曾钿
Owner 惠州TCL环境科技有限公司
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