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Preparation method of high-performance ZAO (Zinc Aluminum Oxide) rotating target material

A rotating target, high-performance technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of low target density, large equipment investment, etc., achieve high density, improve efficiency, and resistivity small effect

Inactive Publication Date: 2014-03-19
河北东同光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the technical problem of large investment in equipment and low density of prepared targets by spraying method for preparing ZAO rotating targets, and provide a method for preparing high-performance ZAO rotating targets

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] The preparation method of a high-performance ZAO rotating target in this embodiment is specifically carried out according to the following steps: the mold is placed on a press, molybdenum disulfide powder is coated on the contact surface between the ZAO powder and the mold, and 2.5kg of ZAO powder is loaded Finally, press it into a rough billet under a pressure of 2MPa; move the rough billet together with the mold into a vacuum hot-press furnace, and evacuate to a vacuum degree of 50Pa; after pressurizing to 15MPa, heat up to 1100°C at a speed of 6°C / min. Heat preservation and pressure for 2.5 hours; then lower the temperature to 80°C and release from the furnace to obtain the ZAO rotating target. Take out the target material, and use the Archimedes method to measure the density to be 5.57g / cm 3 , which is 99.46% of the theoretical density; the target resistivity measured by the four-pin detector method is 3*10 -4 Ω·cm.

[0026] The ZAO powder used in this example is ...

Embodiment 2

[0028] The preparation method of a high-performance ZAO rotating target in this embodiment is specifically carried out according to the following steps: place the mold on the press, coat the molybdenum disulfide powder on the contact surface between the ZAO powder and the mold, and put 5kg of ZAO powder into it. , pressed into a rough billet under a pressure of 10MPa; move the rough billet together with the mold into a vacuum hot-press furnace, and evacuate to a vacuum degree of 48Pa; after pressurizing to 40MPa, raise the temperature to 1350°C at a speed of 6°C / min, and keep it warm Hold the pressure for 5.5 hours; then lower the temperature to 90°C and take out the furnace to obtain the ZAO rotating target. Take out the target material, and use the Archimedes method to measure the density to be 5.58g / cm 3 , which is 99.64% of the theoretical density; the target resistivity measured by the four-pin detector method is 5*10 -4 Ω·cm.

[0029] The ZAO powder used in this exampl...

Embodiment 3

[0031] The preparation method of a high-performance ZAO rotating target in this embodiment is specifically carried out according to the following steps: place the mold on the press, coat the molybdenum disulfide powder on the contact surface between the ZAO powder and the mold, and put 5kg of ZAO powder into it. , pressed into a rough billet under a pressure of 3MPa; move the rough billet together with the mold into a vacuum hot-press furnace, and evacuate to a vacuum degree of 10Pa; after pressurizing to 37MPa, raise the temperature to 1400°C at a rate of 6°C / min, and keep it warm Hold the pressure for 6 hours; then cool down to 70°C and take out the furnace to obtain the ZAO rotating target. Take out the target material, and use the Archimedes method to measure the density to be 5.59g / cm 3 , which is 99.80% of the theoretical density; the target resistivity measured by the four-pin detector method is 9*10 -4 Ω·cm.

[0032] The ZAO powder used in this example is prepared ac...

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Abstract

The invention discloses a preparation method of a high-performance ZAO (Zinc Aluminum Oxide) rotating target material, relates to a preparation method for forming a ceramic target material containing zinc oxide-doped alumina, and is mainly used for solving the technical problems that the conventional spraying method for preparing the ZAO rotating target material is expensive in equipment and the prepared target material is low in density. The preparation method disclosed by the invention comprises the following steps: 1, pressing ZAO powder into a rough blank in a mold; 2, preparing the ZAO rotating target material by using a vacuum hot pressing sintering process. The preparation method disclosed by the invention is simple, convenient and feasible, high in efficiency and low in energy consumption, and moreover no additives are added in the preparation process; the ZAO rotating target material prepared by using the preparation method is good in compactness and low in electrical resistivity; the ZAO rotating target material can be applied to fields of anti-fogging windscreen glass, insulating anti-radiation glass, liquid crystal displays, touch screen glass, anti-reflection glass, and the like.

Description

technical field [0001] The invention relates to a preparation method for forming a zinc oxide-doped aluminum ceramic target material. Background technique [0002] ZAO is ZnO doped with Al 2 o 3 Ceramics, the doping ratio is generally 98:2 ~ 90:10, ZnO is a direct bandgap wide bandgap n-type semiconductor material with hexagonal wurtzite structure, ZnO based film has pressure sensitivity, piezoelectricity, transparency Excellent properties such as electrical conductivity and photoelectricity. Al doping in ZnO system 2 o 3 The ZAO transparent conductive film is made, the conductive performance of the film is greatly improved, and it has photoelectric characteristics comparable to ITO. ZAO thin film is easy to prepare, rich in element resources and non-toxic, and has gradually become the best substitute for ITO thin film. At present, most of the market is planar targets, but the utilization rate of planar targets is low, only 20%-30%. With the continuous updating of tech...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/06
Inventor 康明生崔娜齐梦强朱辉吴洁岳子云
Owner 河北东同光电科技有限公司
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