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Method for femtosecond laser etching glass based on electronic dynamic regulation and control

An electronic dynamic control, femtosecond laser technology, applied in the field of femtosecond laser applications, can solve the problems of limited capacity, low etching efficiency, and high removal efficiency

Active Publication Date: 2014-03-05
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The material removal efficiency of the former method is high, but the ability of this method to process micropores with high aspect ratio is limited; the second preparation method is divided into two steps: first, micropores are scanned inside the glass material with a focused femtosecond laser Then immerse the irradiated glass material in a hydrofluoric acid solution of a certain concentration, and the material in the laser irradiation modification area will undergo a chemical reaction with the hydrofluoric acid solution to be removed, and micropores with a large depth-to-diameter ratio can be realized. However, the disadvantage of this method is that the etching efficiency of the irradiation modification area in hydrofluoric acid solution is low

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  • Method for femtosecond laser etching glass based on electronic dynamic regulation and control

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Embodiment 1

[0020] Firstly, the traditional femtosecond laser pulse was used to irradiate the modification, and the etching efficiency was calculated. The etching efficiency was defined as the length of the etched micropore per unit time. The specific processing steps are as follows:

[0021] (1) Turn on the first mechanical switch 2 and turn off the second mechanical switch 9. At this time, only the sub-pulse light I is used for processing, and the optical path is adjusted to ensure that the laser incident direction is perpendicular to the surface of the processed sample;

[0022] (2) By adjusting the first half-wave plate 6 and the polarizer 5, the energy of the sub-pulse light I is adjusted to 2 μJ; the energy of the sub-pulse light I is reflected by the beam combiner 12 to 1 / 2, and actually acts on the sample The laser energy is 1μJ, the focused spot diameter is about 6μm, and the energy density is about 3.5J / cm 2 .

[0023] (3) The computer 17 controls the mobile platform 16 to mov...

Embodiment 2

[0026] The following takes femtosecond laser double pulse as an example to illustrate the effect of etching enhancement after femtosecond laser double pulse irradiation modification.

[0027] The method for improving the etching efficiency of glass materials by using femtosecond laser double pulses proposed by the present invention, the specific processing steps are as follows:

[0028] (1) Turn on the first mechanical switch 2 and the second mechanical switch 9 respectively, adjust the optical path, and ensure that the incident direction of the laser is perpendicular to the surface of the processed sample;

[0029] (2) By adjusting the first half-wave plate 6 and the first polarizer 5, adjust the energy of the sub-pulse light I to 0.5 μJ; by adjusting the second half-wave plate 10 and the second polarizer 11, adjust the energy of the sub-pulse light II The energy is adjusted to 1.5 μJ; at this time, because of the reflection of the beam combiner 12, the total energy actually ...

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Abstract

The invention relates to a method for femtosecond laser etching glass based on electronic dynamic regulation and control and particularly relates to a method for scanning and modifying glass through femtosecond laser dipulse to improve the etching efficiency of a modified region, which belongs to the field of application technology of femtosecond laser. Traditional femtosecond laser is modulated to femtosecond laser dipulse to regulate and control the instant electronic state of a material so as to reinforce the modification degree and the modification uniformity of a femtosecond laser irradiation region to improve the etching efficiency of the irradiation region finally, and the etching efficiency of the modified region can be improved for multiple times compared with that of traditional femtosecond laser pulse.

Description

technical field [0001] The invention relates to a method for etching glass with a femtosecond laser based on electronic dynamic control, in particular to a method for scanning and modifying glass with double pulses of femtosecond laser, thereby improving the etching efficiency of the modified area, which belongs to femtosecond laser Field of application technology. Background technique [0002] Micro-opto-electromechanical systems require optical detection, so in many applications it is necessary to use transparent dielectric materials as substrates, and process some microporous structures on the substrates to cooperate with fluid or spectral detection. Glass is a transparent dielectric material with good optical properties. At present, microporous structures processed on glass substrates have been widely used in MEMS and biochips. [0003] Due to its ultra-high peak power and ultra-short pulse duration, femtosecond laser can break through the optical diffraction limit and ...

Claims

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Application Information

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IPC IPC(8): C03C15/00
Inventor 姜澜刘鹏军胡洁
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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