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Method for predicting components by analytical process to prepare Fe-Ga alloy film

A technology of alloy thin film and analysis method, which is applied in the direction of material selection for magnetostrictive devices, metal material coating process, manufacture/assembly of piezoelectric/electrostrictive devices, etc., can solve the problem of difficult preparation of low melting point gallium metal Alloy film and other issues

Inactive Publication Date: 2015-07-01
NANCHANG INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method adopts an analytical formula, which can calculate and predict the composition of the film prepared by magnetron sputtering according to the ratio of the patch metal area to the alloy target area, which can solve the difficulty in preparing low melting point gallium metal alloys by traditional multi-target magnetron sputtering preparation methods Film Disadvantages

Method used

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  • Method for predicting components by analytical process to prepare Fe-Ga alloy film
  • Method for predicting components by analytical process to prepare Fe-Ga alloy film
  • Method for predicting components by analytical process to prepare Fe-Ga alloy film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0074] Using JZCK-600F multi-functional coating equipment, using alloy single target for magnetron sputtering. Alloy target composition is Fe 75 Ga 25 . A circular alloy target with a diameter of 60 mm and a thickness of 3 mm is installed on the target holder, and the target base distance is 100 mm.

[0075] Coating sputtering process parameters and operation steps are:

[0076] 1. Selection and pretreatment of substrates

[0077] Choose polished glass or Si wafer as the substrate. Before sputtering, the surface of the substrate is strictly cleaned with acetone, ethanol, and deionized water to remove oil, dirt, and oxides. Ultrasonic cleaning is used to enhance the cleaning effect. After cleaning, dry it with a heat source for later use;

[0078] 2. Prediction and calculation of film composition

[0079] A certain number of iron sheets are selected, and the pure iron sheets are attracted and attached to the etching area of ​​the alloy target by magnetic force, and the pu...

Embodiment 2

[0095] Using JZCK-600F multi-functional coating equipment, using alloy single target for magnetron sputtering. Alloy target composition is Fe 75 Ga 25 . A circular alloy target with a diameter of 60 mm and a thickness of 3 mm is installed on the target holder, and the target base distance is 100 mm.

[0096] Coating sputtering process parameters and operation steps are:

[0097] 1. Selection and pretreatment of substrates

[0098]Choose polished glass or Si wafer as the substrate. Before sputtering, the surface of the substrate is strictly cleaned with acetone, ethanol, and deionized water to remove oil, dirt, and oxides. Ultrasonic cleaning is used to enhance the cleaning effect. After cleaning, dry it with a heat source for later use;

[0099] 2. Prediction and calculation of film composition

[0100] A certain number of iron sheets are selected, and the pure iron sheets are attracted and attached to the etching area of ​​the alloy target by magnetic force, and the pur...

Embodiment 3

[0116] Using JZCK-600F multi-functional coating equipment, using alloy single target for magnetron sputtering. Alloy target composition is Fe 75 Ga 25 . A circular alloy target with a diameter of 60 mm and a thickness of 3 mm is installed on the target holder, and the target base distance is 100 mm.

[0117] Coating sputtering process parameters and operation steps are:

[0118] 1. Selection and pretreatment of substrates

[0119] Choose polished glass or Si wafer as the substrate. Before sputtering, the surface of the substrate is strictly cleaned with acetone, ethanol, and deionized water to remove oil, dirt, and oxides. Ultrasonic cleaning is used to enhance the cleaning effect. After cleaning, dry it with a heat source for later use;

[0120] 2. Prediction and calculation of film composition

[0121] A certain number of iron sheets are selected, and the pure iron sheets are attracted and attached to the etching area of ​​the alloy target by magnetic force, and the pu...

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Abstract

The invention provides a method for predicting components by an analytical process to prepare an Fe-Ga alloy film. JZCK-600F type multifunctional coating equipment is adopted, an alloy single target is utilized for magnetron sputtering, the alloy target is composed of Fe75Ga25, a round alloy target with a diameter of 60mm and a thickness of 3mm is installed on a target seat, and the target-substrate distance is 100mm. The method includes the steps of: selecting a substrate and performing pretreatment; conducting film component prediction calculation; determining a required sheet iron area; carrying out sputtering coating; performing sampling: taking out a well prepared sample when the film and substrate cool to room temperature, and placing the sample into a drying vessel to prevent the structure and properties of the film from changing in the air; employing EDS (energy disperse spectroscopy) or x-ray fluorescence analysis (XRF) to detect components, conducting comparison with predicted values, and calculating the error so as to adjust the sheet iron area for correction during next sputtering. The method provided by the invention solves the difficulty of hard preparation of an alloy film from the low-melting-point metal gallium by elemental target multi-target co-sputtering, and is also convenient for film component control at the same time.

Description

technical field [0001] The invention relates to a method for preparing Fe-Ga alloy thin films by using a magnetron sputtering method, which belongs to the preparation technology of functional materials in the field of material processing engineering. Background technique [0002] At present, in the field of manufacturing integrated magnetostrictive devices, Fe-Ga alloy thin films have been paid more and more attention by people. The core technology in the development of thin film micro-devices is the preparation of thin films. The mechanical, physical and chemical properties of the film depend on the structure of the film, and the structure of the film is closely related to the composition of the film. [0003] Magnetron sputtering deposition technology is a common method for preparing metal and alloy thin films, and it is also the most commonly used technology for preparing giant magnetostrictive films. Magnetron sputtering deposition technology generally uses simple subs...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/54C23C14/14H01L41/12H01L41/20H01L41/22
Inventor 晏建武罗亮张晨曙
Owner NANCHANG INST OF TECH
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