Moving-iron cableless six-degree-of-freedom magnetic levitation motion platform with vacuum cover

Abstract

The invention discloses a moving-iron cableless six-degree-of-freedom magnetic levitation motion platform with a vacuum cover and is mainly applied to semiconductor photoetching equipment. The magnetic levitation motion platform comprises a base, a stator, a rotor, a slide holder and a measurement system, wherein a three-axis gyroscope, a three-axis accelerator, a power supply module and a wireless signal output module are arranged between the rotor and the slide holder and are integrated on a circuit board; the rotor and the stator are respectively arranged in a vacuum cavity. The moving-iron cableless six-degree-of-freedom magnetic levitation motion platform realizes high-precision measurement by adopting a planar grating scale measurement system and also realizes a cableless design of the magnetic levitation motion platform by applying a wireless charging technology and a wireless signal transmission technology, and moving parts of the magnetic levitation motion platform can realize large-angle free rotation in a horizontal plane; therefore, the interference resistance of a workbench and the control bandwidth of a control system are greatly improved; meanwhile, the influence of gas released by certain pouring sealants on photoetching is avoided during extreme ultraviolet photoetching.

Description

technical field [0001] The invention relates to a maglev workbench, in particular to a six-degree-of-freedom maglev workbench, which is mainly used in semiconductor photolithography equipment and belongs to the technical field of ultra-precision processing and detection equipment. Background technique [0002] The micro-motion table with high precision and fast response has an extremely important position in modern manufacturing technology, and is regarded as an important symbol of a country's high-tech development level. In ultra-precision machine tools, the ultra-precision micro-motion table is used to compensate the error of the feed system to achieve ultra-precision machining; in the manufacture of large-scale integrated circuits, the ultra-precision micro-motion table is used for micro-positioning in lithography equipment and micro-feeding; in the scanning probe microscope, the ultra-precise micro-motion table is used to measure the surface topography of the sample for ...

AI Technical Summary

Problems solved by technology

The silicon wafer stage technology using the maglev planar motor can meet the requirements of lithography equipment, but when there is extreme ultraviolet lithography, some potting glue of the maglev planar motor will release some gas, which will have a certain impact on the lithography, and the planar There will be a large number of power sources and sensor cables on the motor to interfere with the movement, and its performance is limited to a certain extent

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