Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Diamond-like carbon composite molybdenum disulfide nano multilayer film and method for preparing same

A technology of compounding molybdenum disulfide and diamond film, which is applied in metal material coating technology, coating, ion implantation plating, etc., can solve the problems of brittleness, poor toughness, low friction, and low hardness of soft molybdenum disulfide film , to achieve the effect of good bearing capacity and anti-wear ability

Active Publication Date: 2013-03-27
徐州睿创智能科技有限公司
View PDF5 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a diamond-like composite molybdenum disulfide nano-multilayer film and its preparation method, which overcomes the brittleness, poor toughness, low hardness and poor wear life of soft molybdenum disulfide films in the existing high-hardness diamond-like films. and other problems, the obtained diamond-like composite molybdenum disulfide nano-multilayer film has the characteristics of ultra-low friction, high hardness and toughness integration

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Diamond-like carbon composite molybdenum disulfide nano multilayer film and method for preparing same
  • Diamond-like carbon composite molybdenum disulfide nano multilayer film and method for preparing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] The substrate material is stainless steel (1Cr18Ni9Ti), and after ultrasonic cleaning, it is placed in a double-target magnetron sputtering vapor deposition system, and the following steps are followed: (a) Argon gas is introduced into the vacuum chamber, and the pressure is kept at 1-1.5Pa , turn on the bias power supply and adjust it to -1000V, perform argon ion discharge cleaning and activation on the surface of the stainless steel substrate, the time is 15-30min; (b) single-layer diamond-like film deposition, argon atmosphere, discharge pressure is 0.8Pa, using DC The current of the graphite target controlled by the power supply is 1.2A, the bias voltage applied to the stainless steel substrate is -300V, and the deposition time is 15min; (c) the single-layer molybdenum disulfide lubricating film layer is deposited, and the molybdenum disulfide target is controlled by a radio frequency power supply, and the power supply of the target is 500W. The deposition time is 3 ...

Embodiment 2

[0018] The substrate material is stainless steel (1Cr18Ni9Ti), and after ultrasonic cleaning, it is placed in a double-target magnetron sputtering vapor deposition system, and the following steps are followed: (a) Argon gas is introduced into the vacuum chamber, and the pressure is kept at 1-1.5Pa , turn on the bias power supply and adjust it to -1000V, perform argon ion discharge cleaning and activation on the surface of the stainless steel substrate, the time is 15-30min; (b) single-layer diamond-like film deposition, argon atmosphere, discharge pressure is 0.8Pa, using DC The current of the graphite target controlled by the power supply is 1.2A, the bias voltage applied to the stainless steel substrate is -300V, and the deposition time is 8min; (c) the single-layer molybdenum disulfide lubricating film is deposited, and the molybdenum disulfide target is controlled by a radio frequency power supply, and the power of the target power supply is 500W. The deposition time is 1.5...

Embodiment 3

[0020] The base material is stainless steel (1Cr18Ni9Ti). After ultrasonic cleaning, it is placed in a double-target magnetron sputtering vapor deposition system. The following steps are followed: (a) Argon gas is introduced into the vacuum chamber to keep the pressure at 1-1.5Pa, Turn on the bias power supply and adjust it to -1000V, and perform argon ion discharge cleaning and activation on the surface of the stainless steel substrate for 15-30 minutes; (b) single-layer diamond-like film deposition, argon atmosphere, discharge pressure of 0.8Pa, using DC power supply The graphite target current was controlled at 1.2A, the bias voltage applied to the stainless steel substrate was -300V, and the deposition time was 4 minutes; (c) single-layer molybdenum disulfide lubricating film was deposited, and the molybdenum disulfide target was controlled by radio frequency power supply, and the target power was 500W. The time is 1min; (d) Repeat the process (b) and (c) 50 times, after na...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
hardnessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a diamond-like carbon composite molybdenum disulfide nano multilayer film and a method for preparing the same. A double-target magnetron sputtering technology is adopted to alternatively deposit diamond-like carbon layers and molybdenum disulfide layers on a stainless steel base, so that the diamond-like carbon composite molybdenum disulfide nano multilayer film is obtained, wherein the thickness of a single diamond-like carbon layer is between 10 and 100 nanometers, the thickness of a single molybdenum disulfide layer is between 10 and 100 nanometers, and the total thickness of the diamond-like carbon composite molybdenum disulfide nano multilayer film is between 1.5 and 6 micrometers. By the prepared nano multilayer film, the wearing life defect and the problems of friction coefficient environment sensitivity of the molybdenum disulfide layer are improved, moreover, the problems of large brittleness, poor toughness and the like of a hard diamond-like carbon film are solved, so that the wear rate of the nano multilayer film in high vacuum environments is reduced by 1-2 orders of magnitude compared with the wear rate of a conventional molybdenum disulfide or diamond-like carbon film, and the perfect matching of ultralow friction and high hardness and toughness is realized.

Description

technical field [0001] The invention relates to a diamond-like composite molybdenum disulfide nano-multilayer film and a preparation method thereof, belonging to the field of solid lubricating film materials. Background technique [0002] High-hardness diamond-like carbon film and magnetron sputtered molybdenum disulfide film are two kinds of solid lubricating films that have been widely used in the fields of aerospace and high-tech equipment oil-free lubrication systems in recent years. Among them, the high-hardness and low-friction diamond-like carbon film is a new type of protective film that has attracted more attention in recent years. It has the characteristics of integration of wear resistance and lubrication. However, diamond-like carbon films have bottlenecks such as high stress and brittleness, which directly limit their wide application in high-tech fields. Therefore, diamond-like carbon films with strong and tough properties have always been the ideal film materi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/35
Inventor 王立平亓健伟王云锋薛群基
Owner 徐州睿创智能科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com