Method for manufacturing thin film transistor, method for manufacturing array substrate and display device
A technology of a thin film transistor and a manufacturing method, which is applied to the manufacturing method of an array substrate, a display device, and a manufacturing method, can solve the problems of long manufacturing time, high manufacturing cost, complicated process, etc. the effect of shortening
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[0043] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
[0044]Aiming at the problem that in the prior art when manufacturing metal oxide thin film transistors, no matter whether dry etching or wet etching is used, the metal oxide under the TFT channel region may be converted into a conductor, thereby making the thin film transistor invalid. The embodiment of the invention provides a method for manufacturing a thin film transistor and a method for manufacturing an array substrate. The semiconductor layer of the thin film transistor is made of metal oxide. The manufacturing method uses two-step etching to form a TFT channel. The first step is through Dry etching removes part of the source and drain metal layer in the TFT channel region above the semiconductor layer without damaging the semiconductor layer b...
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