Particle source and preparation method thereof

Abstract

The invention discloses a particle source which comprises a base and a tip, wherein the base is provided with a gradual top, and the tip is provided wih a slight bulge on the base. The particle source disclosed by the invention can provide large beam flow density and small beam flow angle.

Description

technical field [0001] The present invention relates to a particle source, more particularly to a particle source for an electron microscope, a focused ion beam, a micro-focus X-ray tube, an electron beam lithography machine, an ion beam lithography machine and a manufacturing method thereof. Background technique [0002] Imaging systems such as electron microscopes, focused ion beams, micro-focus X-ray tubes, electron beam lithography, and ion beam lithography play an important role in various fields such as micro-nano detection and manufacturing. [0003] An electron source for generating electrons and an ion source for generating ions (collectively referred to as a particle source, usually a wire) are key components of these imaging systems. The performance of the particle source ultimately determines the resolution, contrast and other important performances of the imaging system. [0004] The most commonly used electron source is the Schottky field emission electron sou...

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Problems solved by technology

[0004] The most commonly used electron source is the Schottky field emission electron source, which has the advantages of long life compared with the traditional thermal electron source, but the disadvantages are large equivalent diameter, low resolution, low brightness, and poor uniformity of electron energy Wait

The advantages of the cold field emission electron source, which is currently considered to be superior in performance, are that the equivalent diameter is very small, and the brightness is much higher than that of the Schottky field emission electron source at high voltage, but the brightness deteriorates sharply at low voltage, and many materials, especially biological samples Must be detected in low voltage mode to not be damaged

[0005] The gaseous field emission ion source appeared very early. The advantage is that the equivalent diameter is small and the ion energy distribution is uniform. The disadvantage is that the beam density is not high, and because the micro-nano processing technology limits the size of the tip, the divergence angle of the ion source is large. Not applicable to focused ion beam systems

At present, the most commonly used ion source is a liquid metal ion source, which has a high beam current density, but has a large equivalent diameter and uneven ion energy distribution.

In recent years, due to the successful development of pyramid-shaped atomic-level needle tips, the application of gas field emission ion sources in focused ion beams has become possible, but the shortcomings of its low beam current density still greatly limit its application, especially in micro-nano manufacturing.

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