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Method for evaluating vapor blocking performance

An evaluation method, water vapor technology, applied in the direction of suspension and porous material analysis, permeability/surface area analysis, measuring device, etc., can solve the problems of complicated preparation process, time-consuming, time-consuming and other problems

Inactive Publication Date: 2012-08-01
MITSUBISHI MATERIALS CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, in the evaluation methods based on the above-mentioned MOCON method and the like, it is difficult to evaluate high water vapor barrier properties, and it is necessary to keep the test piece under a predetermined temperature and humidity environment for a long time when actually measuring the water vapor transmission rate. and things like taking a long time
If it takes time to actually measure the water vapor transmission rate, it will take a lot of time for product research and development, quality inspection, quality control, etc., and as a result, it will take a lot of time and cost to manufacture the product.
In addition, in the conventional evaluation method shown in the above-mentioned Patent Document 1, there is a problem that after the metal corrosion test piece is formed, in order to isolate it from moisture in the atmosphere that is irrelevant to the measurement, a non-corrosive metal or a material with high barrier properties is used. Transparent oxide protection or sealing with curable resin and glass substrate, etc., the preparation process before measurement is cumbersome, laborious and time consuming

Method used

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  • Method for evaluating vapor blocking performance
  • Method for evaluating vapor blocking performance
  • Method for evaluating vapor blocking performance

Examples

Experimental program
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Effect test

Embodiment 1～8

[0053] A test piece in which a water vapor barrier film was formed on a glass substrate was obtained under the conditions shown in Table 1 below. In addition, the film formation of the water vapor barrier film is carried out by reactive plasma vapor deposition, and Examples 1 to 7 use a vapor deposition material composed of the first oxide (X) and a vapor deposition material composed of the second oxide (Y). Co-deposition of two vapor deposition materials was performed, and Example 8 was performed using one vapor deposition material including both the first oxide (X) and the second oxide (Y).

Embodiment 8

[0053] A test piece in which a water vapor barrier film was formed on a glass substrate was obtained under the conditions shown in Table 1 below. In addition, the film formation of the water vapor barrier film is carried out by reactive plasma vapor deposition, and Examples 1 to 7 use a vapor deposition material composed of the first oxide (X) and a vapor deposition material composed of the second oxide (Y). Co-deposition of two vapor deposition materials was performed, and Example 8 was performed using one vapor deposition material including both the first oxide (X) and the second oxide (Y).

[0054] Next, these test pieces were left to stand under conditions of a temperature of 25° C. and a relative humidity of 50% RH for one day, and then the water drop contact angle θ of the water vapor barrier film was obtained. The water droplet contact angle θ is a contact angle based on a droplet method measured 2 seconds after dropping 2 μL of ion-exchanged water onto a film formed on...

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Abstract

The invention provides a method for evaluating the vapor blocking performance. The method can easily evaluate the vapor blocking performance of a vapor blocking film without the need of actual measurement of the vapor permeability. An evaporation material formed by a first oxide (X) and an evaporation material formed by a second oxide (Y), or an evaporation material formed by the first oxide (X) and the second oxide (Y) are used to evaluate the vapor blocking performance of a vapor blocking film which is formed by a vacuum film forming method. The method is characterized in that the vapor blocking performance is evaluated, with the value of S1 calculated by the following formula (1) being used as the vapor permeability S (g / m2.day) of the vapor blocking film which is measured at the temperature of 40 DEG C and the relative humidity of 90% after the vapor blocking film is already placed for an hour at the temperature of 40 DEG C and the relative humidity of 90%. The formula (1) is log10S1=-0.015*([Theta]*[Delta]B)-0.25, wherein Theta represents a water drop contact angle, and [Delta]B represents an absolute value of the difference between the alkalinity Bx of the first oxide (X) and the alkalinity By of the second oxide (Y).

Description

technical field [0001] The present invention relates to a method for evaluating the water vapor barrier properties of a water vapor barrier film used in devices such as liquid crystal displays, organic EL displays, or solar cells, or packaging materials for food and pharmaceuticals, etc., to impart high moisture resistance . Background technique [0002] Devices such as liquid crystal displays, organic EL displays, or solar cells generally have weak moisture resistance, and their characteristics rapidly deteriorate due to moisture absorption, so they must be equipped with high moisture resistance, that is, gas barrier properties that prevent oxygen or water vapor from permeating or entering. components. [0003] For example, in the case of a solar cell, a back sheet is provided on the back surface of the solar cell module opposite to the light-receiving surface. A typical example of the back sheet is a back sheet composed of a highly moisture-proof water vapor barrier film...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N15/08
Inventor 吉田勇气有泉久美子樱井英章黛良享
Owner MITSUBISHI MATERIALS CORP
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