Gallium nitride (GaN) based personal identification number (PIN) detector based on imaging sapphire substrate and preparation method
A patterned sapphire and ultraviolet detector technology, applied in the field of ultraviolet detectors, can solve the problems of ultraviolet detectors that have not been reported publicly, and achieve the effects of small defect density, small dark current and stable performance
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[0019] Below in conjunction with accompanying drawing and specific example of description, the fabrication process of the GaN-based PIN structure ultraviolet detector based on patterned sapphire substrate of the present invention is described in detail:
[0020] Step 1: Deposit GaN thin film material on patterned sapphire substrate 1, and grow buffer layer 2, n + GaN material layer 3, intrinsic GaN material layer 4, and p-type GaN material layer 5, wherein buffer layer growth includes low-temperature buffer layer growth, recrystallization, three-dimensional growth and two-dimensional growth;
[0021] Step 2: Epitaxial wafer cleaning, first place the epitaxial wafer in chloroform solution for ultrasonic cleaning for 10 minutes, then use chloroform, ether, acetone, and ethanol to clean the epitaxial wafer successively, each step is cleaned for 4-5 minutes, and after cleaning, use N 2 blow dry;
[0022] Step 3: Soak the sample in HF acid for 8 minutes to remove surface oxides, ...
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