Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Polishing solution used for amorphous alloy and polishing method of amorphous alloy

An amorphous alloy, polishing liquid technology, applied in polishing compositions, chemical instruments and methods, etc., can solve the problems of poor polishing effect, difficult to achieve mirror polishing effect, low polishing efficiency, etc., achieve smooth surface, reduce physical harm and Environmental hazards, high polishing efficiency

Active Publication Date: 2012-05-16
BYD CO LTD
View PDF12 Cites 31 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is that the existing amorphous alloy adopts mechanical polishing, which has the disadvantages of low polishing efficiency, poor polishing effect, and difficulty in achieving mirror polishing effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] Embodiment 1 is used for illustrating the polishing method of the amorphous alloy workpiece of the present invention and the polishing liquid that adopts thereof;

[0045] Step 1, pre-treatment: 1) mechanical polishing: the size is 150 × 50 mm 2 The amorphous alloy workpiece is mechanically polished, first with a coarse cloth wheel for rough polishing, then with a wind wheel for semi-fine polishing, and finally with a white cloth wheel for fine polishing, so that the surface roughness of the amorphous alloy workpiece is 0.08-0.15 microns; 2 ) Ultrasonic degreasing: 20g / L Na 2 CO 3 with 25g / L Na 3 (PO 3 ) 2 1000mL of the mixed solution was heated to 40°C; the amorphous alloy workpiece was ultrasonically cleaned in the above solution for 5 minutes, taken out, and cooled to room temperature; 3) Washing: soak the amorphous alloy workpiece in pure water for 1 minute;

[0046] Step 2, plasma polishing:

[0047] 1) Preparation of polishing liquid: prepare 1L of polishing...

Embodiment 2

[0055] The difference between embodiment 2 and embodiment 1 is that the content and polishing conditions of each component in the polishing solution in the plasma polishing step are different: wherein,

[0056] 1) In the polishing liquid, the content of each component is:

[0057] Sodium sulfate: 12g / L Ammonium sulfate: 15g / L Ammonium bifluoride: 1g / L

[0058] Cerium sulfate: 30ppm Organic phosphonic acid: 2g / L Benzotriazole: 1g / L Sodium citrate: 20g / L

[0059] Sodium sulfosuccinate: 1mL / L Sodium ethylhexylsulfonate: 3ml / L

[0060] 2) The conditions for plasma polishing are: set the pulse working voltage to 340V, pulse frequency to 12KHz, duty cycle to 10%, operating temperature to 80°C, and polish for 4 minutes;

[0061] Amorphous alloy piece A2 was obtained after plasma polishing.

Embodiment 3

[0063] The difference between Example 3 and Example 1 is that the content of cerium sulfate in the polishing liquid is 15 ppm, and the amorphous alloy piece A3 is obtained after plasma polishing.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
surface roughnessaaaaaaaaaa
reflectanceaaaaaaaaaa
Login to View More

Abstract

The invention provides a polishing solution used for an amorphous alloy and a polishing method of an amorphous alloy. The polishing solution comprises: a sodium salt, an ammonium salt and a brightener, i.e. ceric sulfate. The polishing method includes plasma polishing to an amorphous alloy. And the plasma polishing method consists of: connecting the amorphous alloy to a positive electrode, and immersing the amorphous alloy into an electrolytic cell containing the polishing solution, and taking the electrolytic cell body as a negative electrode for plasma polishing. The amorphous alloy prepared with the polishing solution provided in the invention and by the plasma polishing method of the invention has a smooth surface and high surface reflectivity.

Description

Technical field [0001] The invention involves the surface treatment field of amorphous alloys. Specifically, it involves a polishing method for polishing fluid for amorphous alloy and a polishing method of an amorphous alloy. Background technique [0002] At present, the appearance requirements of metal parts are getting higher and higher, especially the metal parts used in electronic products. The comprehensive requirements of the surface roughness and surface reflectance parameters are becoming stricter.The surface treatment of general metal parts includes polishing, anode oxidation, micro -oxidation, and electroplating.Among them, polishing can be used as a preferred process for the surface treatment of metal parts to effectively improve the surface performance of the metal parts. It can also be used as a preliminary process of various (including special functions) surface modification technology to provide convenience for subsequent processing. [0003] A amorphous alloys are...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/18C25F3/16
Inventor 曹朝波
Owner BYD CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com