Double workpiece table revolution exchanging method and device based on self rotating direction adjustment of measurement positions

Abstract

A double workpiece table revolution exchanging method and a device thereof based on self rotating direction adjustment of measurement positions belong to the technical field of semiconductor manufacturing equipment. The device comprises a turning table switching device, and mechanically and structurally comprises a rotating motor stator arranged below a base table, a rotating motor rotor penetrating through the base table, a shaft sleeve embedded into the base table, and a silicon wafer table switching device. The turning table switching device realizes the position exchange of a silicon wafer table of a lithography machine, has the advantages that the structure is simple, the table switching beats are few, the rotary inertia is small, the time for switching double tables is short, and the like, is provided with a silicon wafer table self rotating mechanism in the silicon wafer table, and structurally comprises a silicon wafer table rotating shaft and a silicon wafer table spinning motor. A lifting shaft connecting device is arranged at the measuring position of the base table, and the silicon wafer table self rotating mechanism and the shaft connecting device can realize the self rotating of the silicon wafer table, thereby solving the problem that in the existing scheme of switching the table by rotating, the phase reverse of the silicon wafer table is difficult to be matched with an optical system.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and device for rotating and exchanging double worktables based on measuring position rotation and direction adjustment. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. Throughout the development process of lithography machines, lithography machines have developed from contact lithography machines, proximity lithography machines, full-silicon wafer scanning projection lithography machines, and step-and-repeat projection lithography machines to the current popular stepping lithography machines. The development history of scanning projection lithography machine. The three major indicators of lithography machine performance: lithography machine resolution, overlay accuracy, and productivity have always been the goals pursued by p...

AI Technical Summary

Problems solved by technology

At the same time, the spin of the workpiece table is used to solve a series of problems such as the reverse direction of the workpiece table, the winding of the workpiece table cable, the large radius of gyration, and the large moment of inertia, which were neglected in the previous scheme of the rotary table.

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