Double workpiece table revolution exchanging method and device based on self rotating direction adjustment of measurement positions
A dual workpiece table and workpiece table technology, which is applied to the exposure device of photoengraving process, microlithography exposure equipment, etc., can solve the problems of cable entanglement, large moment of inertia, and large radius of gyration on the workpiece table, and achieve the time of changing the table. Small, small moment of inertia, the effect of improving productivity
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[0025] Embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0026] A method for rotating and exchanging double worktables based on measuring position rotation and direction adjustment, the method includes the following steps:
[0027] The initial state of the system is that the exposure of the first workpiece table at the exposure station is completed, and the alignment of the second workpiece table at the measurement position is completed, and it is stipulated that the phase of the workpiece table is positive at this time, and then the double workpiece table is transposed;
[0028] The first step is to drive the second workpiece table to the predetermined position where the rotation axis of the second workpiece table is docked with the shaft joint device. After the docking is successful, the second workpiece table is rotated counterclockwise (or clockwise) by using the second workpiece table spin mechanism. Ro...
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