Method for improving stability and repeatability of extraction beam current of ion implanter
An ion implanter and stability technology, applied in discharge tubes, electrical components, circuits, etc., can solve the problems of variation, unsatisfactory stability and repeatability of the drawn beam, and achieve the effect of improving stability and repeatability
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[0021] Below in conjunction with accompanying drawing, the present invention will be further introduced.
[0022] see figure 1 , figure 2
[0023] The whole method is divided into 3 parts: arc starting, optimization, closed-loop adjustment
[0024] 1. Arcing:
[0025] Set the initial value of each power supply, set the initial value of the lead-out electrode
[0026] The ion source is supplied with gas to ensure the optimal working pressure of the ion source cavity corresponding to the dopant element
[0027] Wait for the power supply to work stably, and wait for the air supply to stabilize
[0028] Slowly reduce the current of the filament power supply, and keep the other power supplies at the initial value of the arc until the arc current is generated.
[0029] Continue to slowly reduce the filament power supply current to find the best filament power supply current, so that the power of the bias voltage power supply is gradually increased to obtain the maximum and mo...
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