Composite structural target for arc ion plating deposition magnetic material coating and application of composite structural target

Abstract

The invention belongs to the field of preparation of films, and in particular relates to a design of a composite structural target for an arc ion plating deposition magnetic material coating and application of the composite structural target. The composite structural target consists of a target shell and a magnetic material target, wherein the target shell is tightly fixed at the periphery of themagnetic material target and is a metal target shell with low saturation vapor pressure and low secondary electron emission yield, or is a target shell which is formed by attaching a ceramic phase material layer to a processable metal ring; the processable metal ring is tightly fixed at the periphery of the magnetic material target; and the ceramic phase material layer is attached to a surface ofthe processable metal ring in the direction parallel to a target surface of the magnetic material target. By the composite structural target and the application thereof, the problem that the magneticmaterial coating is difficult to deposit through arc ion plating, the problem that the target is difficult to apply industrially because the service life of the target is shortened when magnetic shielding is eliminated by adding a groove on the surface of a ferromagnetic target, and the like are solved, design thoughts of the composite structural target which makes a device simply manufactured and has low cost are provided, and the application range of the arc ion plating is expanded.

Description

technical field [0001] The invention belongs to the field of thin film preparation, in particular to the design and application of a composite structure target material for arc ion plating deposition of magnetic material coating. Background technique [0002] Arc ion plating (AIP) technology originated from the arc deposition coating phenomenon discovered by Edison in the middle and late 19th century. The vacuum system was fed with argon gas to 1-10 -1 Pa, use the method of adding a trigger electric pulse between the arc starting electrode and the cathode or short-circuiting the two to initiate an arc discharge between the cathode made of the evaporated material and the anode formed in the vacuum chamber and generate High density metal vapor plasma. The positive charge density near the cathode target increases due to the rapid flight of electrons away from the cathode region. The arc spot is in the stable etching stage. When the electric field intensity formed by positive ...

AI Technical Summary

Problems solved by technology

[0006] One of the objectives of the present invention is to provide a composite structure target material for arc ion plating deposition magnetic material coating and its application with simple structure, low cost and high efficiency. In order to solve the problem of adding grooves on the surface of the ferromagnetic target material to overcome When shielding, the service life of the target is reduced, and it is difficult to apply in industry

[0007] Another object of the present invention is to provide a composite structure target for arc ion plating deposition of magnetic material coatings and its application, which solves the equipment operation caused by adding a coupling magnetic field in the deposition system to change the distribution of magnetic force lines on the target surface Complex and cost-increasing issues

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