Micro-energy system with high weight ratio energy density and method and application thereof
A technology of energy density and weight ratio, applied in the field of microelectronics, can solve problems such as low energy density, achieve space saving, facilitate monolithic integration, and reduce external circuit connections
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[0027] The present invention is a manufacturing process of a high-weight specific energy density micro-energy system (such as figure 2 )as follows:
[0028] ① Clean the back surface of the GaAs solar cell, the cleaning condition is to use isopropanol, megasonic cleaning, room temperature, 3min;
[0029] ②Grow 150-350nm Al film by sputtering; the sputtering conditions are: the distance between the Al target (5N) and the substrate is 4.5cm, and the background pressure is 2×10 -4 Pa, the target should be sputtered for 30min before depositing the film, the sputtering power is 90W, the sputtering atmosphere is Ar, the flow rate is 30sccm, the working pressure is 1.2Pa, the deposition power is 110W, the substrate temperature is less than 90°C during deposition, The rate is 25nm / min, and the continuous deposition time can be adjusted to obtain an Al film with a thickness of about 150-350nm;
[0030] ③Co x Ni 1-x N thin film: Sputtering uses a metal nickel-cobalt alloy with a diam...
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