A method for increasing back gate threshold voltage of soi-pmos device
A threshold voltage, back-gate technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of increasing process complexity, device damage, and increasing costs, and achieve back-gate threshold voltage and improve threshold voltage. Effect
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[0018] The technical solution of the present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.
[0019] Such as figure 1 as shown, figure 1 It is an SOI-PMOS device that can be used in the present invention. The SOI silicon wafer comprises a top silicon film (1), an insulating oxide layer (2) and a silicon substrate (3), and an SOI-PMOS device is prepared on the top silicon film (1). The SOI material is a commercial conventional oxygen ion implantation isolation (SIMOX) sheet, and other thermal bonding and smart-cut (Smart-Cut) sheets can also be used. For a normal working SOI-PMOS device, the gate and drain are connected to the power supply potential (Vdd), and the source and back gate are connected to the ground potential (Vss).
[0020] Bulk silicon PMOS devices in the prior art generally have only three terminals, namely: gate, source and drain, and only focus on the threshold voltage of the gate. The general met...
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