A method and system for simulating moth compound eye optical anti-reflection structure pattern
A structure pattern, anti-reflection technology, applied in microlithography exposure equipment, photolithography process exposure equipment, electrical components, etc., can solve the adhesion effect, thermal matching film stability influence, expensive PECVD deposition, increased reflection loss, etc. problem, to achieve the effect of low cost, high efficiency and simple production process
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[0029] Such as figure 1 As shown, it is a schematic diagram of the system for realizing the moth compound eye optical anti-reflection structure pattern by six-beam interference in the present invention. The laser interference system used includes a laser 1, a beam expander 2, a collimation system 3, a mirror 4, and a polarizing device 5 , beam splitting and refraction system 6, CCD 7. After the laser beam emitted by the laser 1 is expanded 2 and collimated 3, the optical path is refracted by the reflector 4, and the beam is converted into linearly polarized light by the polarizing device 5, and then the laser beam is divided into Six coherent light beams, and then each three beams of the six beams of light are respectively incident on the X and Y planes, so that they are simultaneously irradiated on the CCD 7 at a certain incident angle, forming a periodic optical anti-reflection structure pattern of the compound eye of the moth.
[0030] use figure 2 The shown six-beam int...
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